AVS 66th International Symposium & Exhibition


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Thin Films Division Sessions

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Start Time Session Code Session Title
Monday 8:20am TF+EM+MI+MN+OX+PS-MoM Functional Thin Films: Ferroelectric, Multiferroics, and Magnetic Materials
Monday 8:20am TF-MoM Thin Films for Electrochemistry and Energy Storage
Monday 8:20am AP+2D+EM+PS+TF-MoM Area Selective Deposition and Selective-Area Patterning
Monday 1:40pm TF+2D+AP+EL+SS-MoA ALD and CVD: Nucleation, Surface Reactions, Mechanisms, and Kinetics
Monday 1:40pm TF+SE-MoA HiPIMS and Reactive HiPIMS for Novel Thin Films
Monday 1:40pm 2D+AP+EM+MI+MN+NS+PS+TF-MoA Nanostructures including Heterostructures and Patterning of 2D Materials
Monday 1:40pm 2D+AP+EM+MI+NS+PS+TF-MoA 2D Materials Growth and Fabrication
Monday 1:40pm EM+PS+TF-MoA New Devices and Materials for Logic and Memory
Monday 1:40pm PS+AS+EM+SS+TF-MoA Plasma-Surface Interactions
Tuesday 8:00am TF+AP-TuM ALD and CVD: Precursors and Process Development
Tuesday 8:00am TF+EM+MI-TuM Thin Films for Microelectronics, Photonics, and Optoelectronic Applications
Tuesday 2:20pm TF+PS-TuA Epitaxial Thin Films
Tuesday 2:20pm TF-TuA Emerging Applications for Thin Films
Tuesday 2:20pm AP+EL+MS+PS+SS+TF-TuA Advancing Metrology and Characterization to enable Atomic Layer Processing
Tuesday 2:20pm EM+OX+TF-TuA Nikolaus Dietz Memorial Session: Wide and Ultra-wide Band Gap Materials and Devices
Tuesday 2:20pm OX+EM+HC+MI+NS+SS+TF-TuA Complex Oxides: Catalysis, Dielectric Properties and Memory Applications
Tuesday 2:20pm TL+AS+SS+TF-TuA Breakthroughs and Challenges in Applied Materials for Energy Transition (ALL INVITED SESSION) & Panel Discussion
Wednesday 8:00am TF1-WeM Vapor Deposition of Functional Polymer Thin Films and Composites
Wednesday 8:00am TF2-WeM Thin Film Late News Session
Wednesday 8:00am AP+BI+PS+TF-WeM Surface Reaction Analysis and Emerging Applications of Atomic Scale Processing
Wednesday 8:00am EL+AS+EM+TF-WeM Optical Characterization of Thin Films and Nanostructures
Wednesday 8:00am EM+2D+AS+MI+MN+NS+TF-WeM Nanostructures and Nanocharacterization of Electronic and Photonic Devices
Wednesday 8:00am RA+AS+CA+PS+TF-WeM Reproducibility in Science and Engineering, Including Materials and Energy Systems
Wednesday 2:20pm TF+EM-WeA Emerging Thin Film Materials: Ultra-wide Bandgap and Phase Change Materials
Wednesday 2:20pm EM+2D+NS+TF-WeA THEME Session: Electronics and Photonics for a Low-Carbon Future
Wednesday 2:20pm SE+AS+TF-WeA Nanostructured Thin Films and Coatings
Thursday 8:00am TF+EM+NS+SS-ThM Thin Films for Energy Harvesting and Conversion
Thursday 8:00am AP+PS+TF-ThM Thermal Atomic Layer Etching
Thursday 8:00am EM+AP+MS+NS+TF-ThM Advanced Processes for Interconnects and Devices
Thursday 2:20pm TF+AS+EL+PS+RA-ThA Characterization of Thin Film Processes and Properties
Thursday 2:20pm TF+SS-ThA Metal Halide Perovskites, Other Organic/Inorganic Hybrid Thin Films
Thursday 2:20pm PS+2D+EM+SS+TF-ThA Plasma-Enhanced Atomic Layer Etching
Thursday 6:30pm TF-ThP Thin Films Poster Session
Friday 8:20am TF-FrM Theory and Characterization of Thin Film Properties
Friday 8:20am PS+2D+SE+TF-FrM Plasma Deposition and Plasma-Enhanced Atomic Layer Deposition

AVS 66th International Symposium & Exhibition