| AVS 66th International Symposium & Exhibition | |
| Thin Films Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 1:40pm | TF+2D+AP+EL+SS-MoA1 Invited Paper ALD on Particles: What is Different from Wafers? Ruud van Ommen, Delft University of Technology, Netherlands |
| 2:20pm | TF+2D+AP+EL+SS-MoA3 Insights into Particle ALD Peculiarities from In- and Ex-Situ Characterization Benjamin Greenberg, American Society for Engineering Education, J.A. Wollmershauser, B. Feygelson, U.S. Naval Research Laboratory |
| 3:00pm | TF+2D+AP+EL+SS-MoA5 Controlling the Nucleation of CVD Cobalt Films on SiO2 : Combining an Amido-based Nucleation Promotor with an Amine-based Growth Inhibitor to Afford Atomically-smooth Surfaces Zhejun Zhang, G.S. Girolami, J.R. Abelson, University of Illinois at Urbana-Champaign |
| 3:20pm | TF+2D+AP+EL+SS-MoA6 Plasma-assisted Atomic Layer Epitaxy of Indium Aluminum Nitride Studied Using in situ Grazing Incidence Small-angle X-ray Scattering Jeffrey M. Woodward, ASEE (residing at US Naval Research Laboratory), S.G. Rosenberg, American Society for Engineering Education (residing at US Naval Research Laboratory), S.D. Johnson, N. Nepal, U.S. Naval Research Laboratory, Z.R. Robinson, SUNY Brockport, K.F. Ludwig, Boston University, C.R. Eddy, U.S. Naval Research Laboratory |
| 4:00pm | TF+2D+AP+EL+SS-MoA8 Invited Paper Real-time Monitoring of the Surface Chemistry of Atomic Layer Deposition by Ambient Pressure X-ray Photoelectron Spectroscopy Joachim Schnadt, P. Shayesteh, Lund University, Sweden, R. Tsyshevskiy, University of Maryland, J.-J. Jean-Jacques, F. Bournel, Sorbonne Université, France, R. Timm, Lund University, Sweden, A.R. Head, Brookhaven National Laboratory, G. D'Acunto, F. Rehman, S. Chaudhary, Lund University, Sweden, R. Sánchez-de-Armas, Uppsala University, Sweden, F. Rochet, Sorbonne Université, France, B. Brena, Uppsala University, Sweden, A. Mikkelsen, S. Urpelainen, A. Troian, S. Yngman, J. Knudsen, Lund University, Sweden |
| 4:40pm | TF+2D+AP+EL+SS-MoA10 Kinetics during TMA-H2O ALD: The Possible Role of Cooperative Surface Reactions Brent Sperling, B. Kalanyan, J.E. Maslar, National Institute of Standards and Technology (NIST) |
| 5:00pm | TF+2D+AP+EL+SS-MoA11 Atomic Layer Deposition of Metal Sulfides: Growth and Surface Chemistry Xinwei Wang, Shenzhen Graduate School, Peking University, China |