| AVS 66th International Symposium & Exhibition | |
| Electronic Materials and Photonics Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | EM+OX+TF-TuA1 Invited Paper Nitride-Based Semiconducting Materials: A Long Pathway to Advanced Nuclear Detection Capabilities Vincent Woods, L. Hubbard, Pacific Northwest National Laboratory, Z. Sitar, North Carolina State University, A.Y. Kozhanov, Georgia State University |
| 3:20pm | EM+OX+TF-TuA4 Low Temperature Growth of InN by Atomic Layer Epitaxy Charles R. Eddy, Jr., U.S. Naval Research Laboratory, S.G. Rosenberg, J.M. Woodward, American Society for Engineering Education (residing at U.S. Naval Research Laboratory), K.F. Ludwig, Boston University, N. Nepal, U.S. Naval Research Laboratory |
| 4:20pm | EM+OX+TF-TuA7 Stochiometry- and Orientation-Dependent Native Point Defects of MOCVD-Grown ZnGeN2 Films Micah Haseman, D. Ramdin, R. Karim, The Ohio State University, D. Jayatunga, Case Western Reserve University, H. Zhao, The Ohio State University, K. Kash, Case Western Reserve University, L.J. Brillson, The Ohio State University |
| 4:40pm | EM+OX+TF-TuA8 Low-temperature Growth of Wide Bandgap Nitride and Oxide Thin Films via Plasma-assisted Atomic Layer Deposition: Influence of rf-plasma Source and Plasma Power Necmi Biyikli, S. Ilhom, A. Mohammad, D. Shukla, University of Connecticut |
| 5:00pm | EM+OX+TF-TuA9 Invited Paper Wide Bandgap Dilute Magnetic Semiconductors for Room Temperature Spintronic Applications V.G. Saravade, A. Ghods, Missouri University of Science and Technology, Rolla, MO, USA, N. Ben Sedrine, Universidade de Aveiro, Portugal, C. Zhou, Ian Ferguson, Missouri University of Science and Technology |
| 5:40pm | EM+OX+TF-TuA11 Processing and Characterization of Schottky and Ohmic contacts on (100) β-Ga2O3 Luke Lyle, K. Jiang, E. Favela, D. Moody, T. Lin, P. Chung, Carnegie Mellon University, K. Das, North Carolina State University, Z. Galazka, A. Popp, G. Wagner, Leibniz-Institut für Kristallzüchtung, Germany, L.M. Porter, Carnegie Mellon University |
| 6:00pm | EM+OX+TF-TuA12 III-Nitrides: Enabling Applications with Wide to Ultra-Wide Bandgap Materials and Devices Erica Douglas, A.G. Baca, B.A. Klein, A.A. Allerman, A.M. Armstrong, A. Colon, C.A. Stephenson, R.J. Kaplar, Sandia National Laboratories |