| AVS 66th International Symposium & Exhibition | |
| Atomic Scale Processing Focus Topic | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | AP+PS+TF-ThM1 Invited Paper A Challenge for Selective Atomic Layer Etching of Non-volatile Materials Using Organometalic Complex Yoshihide Yamaguchi, S. Fujisaki, K. Shinoda, Hitachi, Japan, H. Kobayashi, K. Kawamura, M. Izawa, Hitachi High Technologies, Japan |
| 8:40am | AP+PS+TF-ThM3 Characterization of Isotropic Thermal ALE of Oxide Films and Nanometer-Size Structures Andreas Fischer, A. Routzahn, T.B. Lill, Lam Research Corporation |
| 9:00am | AP+PS+TF-ThM4 Advanced Selective Chemical Dry Etch for Oxide and Si-based Material Li-Hung Chen, T. Kato, K. Nakahata, K. Takeya, Tokyo Electron Technology Solutions Limited, Japan |
| 9:20am | AP+PS+TF-ThM5 Mechanisms of Thermal Atomic Layer Etching (ALE) of Metal by Deprotonation and Complex Formation of Hexafluoroacetylacetone (hfacH) Abdulrahman Basher, I. Hamada, Osaka University, Japan, M. Krstic, Karlsruhe Institute of Technology (KIT), Germany, M. Isobe, T. Ito, Osaka University, Japan, K. Fink, Karlsruhe Institute of Technology (KIT), Germany, K. Karahashi, Y. Morikawa, Osaka University, Japan, W. Wenzel, Karlsruhe Institute of Technology (KIT), Germany, S. Hamaguchi, Osaka University, Japan |
| 9:40am | AP+PS+TF-ThM6 Thermal Atomic Layer Etching of Amorphous and Crystalline Al2O3 Films Jessica A. Murdzek, S.M. George, University of Colorado at Boulder |
| 11:00am | AP+PS+TF-ThM10 Thermal Atomic Layer Etching (ALE) of Germanium-Rich SiGe Films Aziz Abdulagatov, S.M. George, University of Colorado at Boulder |
| 11:20am | AP+PS+TF-ThM11 Thermal Atomic Layer Etching of GaN and Ga2O3 Using Sequential Fluorination and Ligand-Exchange Reactions Nicholas Johnson, Y. Lee, S.M. George, University of Colorado at Boulder |
| 11:40am | AP+PS+TF-ThM12 Invited Paper Mechanistic Insights into Thermal Dry Atomic Layer Processing of Metals Andrew Teplyakov, University of Delaware |