| AVS 66th International Symposium & Exhibition | |
| Thin Films Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 1:40pm | TF+SE-MoA1 The Influence of the Magnetic Field on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge H. Hajihoseini, University of Iceland, M. Cada, Z. Hubicka, Academy of Sciences of the Czech Republic, S. Unaldi, LPGP Université Paris-Sud, France, M.A. Raadu, N. Brenning, KTH Royal Institute of Technology, Sweden, Jon Tomas Gudmundsson, University of Iceland, D. Lundin, LPGP Université Paris-Sud, France |
| 2:00pm | TF+SE-MoA2 HIPIMS and Magnetron Sputtering of Niobium for use in Josephson Junctions George Major, M.R. Linford, Brigham Young University |
| 2:20pm | TF+SE-MoA3 Invited Paper Thin Film Crystal Growth of Oxides, Nitrides and Carbindes using High Impulse Magnetron Sputtering Jon-Paul Maria, The Pennsylvania State University |
| 3:00pm | TF+SE-MoA5 Reactive Bipolar High Power Impulse Magnetron Sputtering (B-HiPIMS) for Deposition of High Entropy Carbides Trent Borman, M.D. Hossain, J.-P. Maria, The Pennsylvania State University |
| 3:20pm | TF+SE-MoA6 High Density Titanium Oxide and Silicon Oxide Films Deposited by Current-Controlled High Power Impulse Magnetron Sputtering Arutiun P. Ehiasarian, P.Eh. Hovsepian, D.A. Loch, Sheffield Hallam University, UK |
| 4:00pm | TF+SE-MoA8 Epitaxial Growth and Surface Morphology of Thin Film GaN via HiPIMS Kevin Ferri, E. Runnerstrom, Pennsylvania State University, A. Klump, Z. Sitar, R. Collazo, North Carolina State University, J.-P. Maria, The Pennsylvania State University |
| 4:20pm | TF+SE-MoA9 Reactive HiPIMS Deposition of a Thick Cu:CuCNx Multilayered Nano-composite Coating Material for Improving Machining Process Performance in Rough Turning Md.Masud-Ur Rashid, C.M. Nicolescu, KTH Royal Institute of Technology, Plasmatrix Materials AB, Sweden, A. Archenti, KTH Royal Institute of Technology, Sweden, G. Shuai, KTH Royal Institute of Technology, R. Tomkowski, KTH Royal Institute of Technology, Sweden |
| 4:40pm | TF+SE-MoA10 The Residual Stress Control in Hard Metal Films by Energetic Deposition Y.G. Li, Y.Z. Qu, Z.T. Jiang, M.K. Lei, Dalian University of Technology, China |
| 5:00pm | TF+SE-MoA11 Advanced HIPIMS Coatings Through Kick Pulse Technology Jason Hrebik, Kurt J. Lesker Company |