AVS 66th International Symposium & Exhibition, Session TF+AP-TuM

AVS 66th International Symposium & Exhibition
Thin Films Division	Tuesday Sessions

Session TF+AP-TuM
ALD and CVD: Precursors and Process Development

Tuesday, October 22, 2019, 8:00 am, Room A124-125
Moderators: Paul Poodt, Holst Centre / TNO, The Netherlands, Erwin Kessels, Eindhoven University of Technology, The Netherlands

Click here to Download program book for this session
in Adobe Acrobat format

Click a paper to see the details. Presenters are shown in bold type.

8:00am	TF+AP-TuM1 Invited Paper Mechanism-Based Precursor Design for CVD of Metal Oxides and Sulfides Lisa McElwee-White, University of Florida
8:40am	TF+AP-TuM3 Improved Control of Atomic Scale Processing: Characterization and Optimization of Precursor Mass Delivery Utilizing a Novel Thermal Sensor Daniel Alvarez, J. Spiegelman, C. Ramos, Z. Shamsi, RASIRC
9:00am	TF+AP-TuM4 Effect of Co-Reactant on the Atomic Layer Deposition of Copper Oxide Jason Avila, N. Nepal, V.D. Wheeler, U.S. Naval Research Laboratory
9:20am	TF+AP-TuM5 Electron Enhanced Atomic Layer Deposition (EE-ALD) of Cobalt Films and Development of New Hollow Cathode Plasma Electron Source Zachary Sobell, CU Boulder, A.S. Cavanagh, S.M. George, University of Colorado at Boulder
9:40am	TF+AP-TuM6 Surface Science Studies of GaN Substrates Subjected to Plasma-Assisted Atomic Level Processes Samantha G. Rosenberg, American Society for Engineering Education (residing at U.S. Naval Research Laboratory), D.J. Pennachio, E.C. Young, Y.H. Chang, H.S. Inbar, University of California at Santa Barbara, J.M. Woodward, U.S. Naval Research Laboratory, Z.R. Robinson, SUNY Brockport, J. Grzeskowiak, University at Albany - SUNY, C.A. Ventrice, Jr., SUNY Polytechnic Institute, C.J. Palmstrøm, University of California at Santa Barbara, C.R. Eddy, Jr., U.S. Naval Research Laboratory
11:00am	TF+AP-TuM10 Reaction Pathways in Photolytic CVD of Platinum on Organic Thin Films Bryan G. Salazar, University of Texas at Dallas, H. Liu, L. McElwee-White, University of Florida, A.V. Walker, University of Texas at Dallas
11:20am	TF+AP-TuM11 Process Development and Mechanism Analysis of Low Temperature ALD TiN with TiCl₄/Monomethylhydrazine Taiki Kato, Z. Ni, M. Matsukuma, H. Nakamura, Y. Ideno, Y. Serizawa, Tokyo Electron Technology Solutions Limited, Japan
11:40am	TF+AP-TuM12 Atomic Layer Deposition of Aluminum, Hafnium and Zirconium Oxyfluoride Films with Tunable Stoichiometry Neha Mahuli, J.M. Wallas, S.M. George, University of Colorado at Boulder
12:00pm	TF+AP-TuM13 ALD on Thermally and Chemically Treated Fused Silica and Glass Surfaces Tahereh Gholian Avval, G. Hodges, V. Carver, M.R. Linford, Brigham Young University