| AVS 66th International Symposium & Exhibition | |
| Atomic Scale Processing Focus Topic | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | AP+EL+MS+PS+SS+TF-TuA1 Invited Paper In Situ Ellipsometry Characterization Of Atomic Layer Processes: A Review James Hilfiker, G.K. Pribil, J. VanDerslice, J.A. Woollam Co., Inc. |
| 3:00pm | AP+EL+MS+PS+SS+TF-TuA3 Invited Paper Elucidating the Mechanisms for Atomic Layer Growth through In Situ Studies Jeffrey Elam, Argonne National Laboratory |
| 4:20pm | AP+EL+MS+PS+SS+TF-TuA7 Invited Paper Surface, Interface, or Film: A Discussion of the Metrology of ALD Materials in Semiconductor Applications G. Andrew Antonelli, N. Keller, Nanometrics |
| 5:00pm | AP+EL+MS+PS+SS+TF-TuA9 In Line and Ex Situ Metrology and Characterization to Enable Area Selective Deposition Christophe Vallee, M. Bonvalot, B. Pelissier, J-H. Tortai, S. David, S. belahcen, V. Pesce, M. Jaffal, A. Bsiesy, LTM, Univ. Grenoble Alpes, CEA-LETI, France, R. Gassilloud, N. Posseme, CEA-LETI, France, T. Grehl, P. Bruner, IONTOF GmbH, Germany, A. Uedono, University of Tsukuba, Japan |
| 5:20pm | AP+EL+MS+PS+SS+TF-TuA10 Invited Paper Recent Progress in Thin Film Conformality Analysis with Microscopic Lateral High-aspect-ratio Test Structures Riikka Puurunen, Aalto University, Finland |
| 6:00pm | AP+EL+MS+PS+SS+TF-TuA12 In operandoXPS Study on Atomic Layer Etching of Fe and Co Using Cl2and Acetylacetone or Hexafluoroacetylacetone Zijian Wang, O. Melton, D. Angel, B. Yuan, R.L. Opila, University of Delaware |