| AVS 66th International Symposium & Exhibition | |
| Advanced Surface Engineering Division | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 3:00pm | SE+AS+TF-WeA3 Metallic Glass: From Coating to First-Ever Nanotube Arrays Jinn P. Chu, National Taiwan University of Science and Technology, Taiwan, Republic of China |
| 3:20pm | SE+AS+TF-WeA4 Tin Oxide Nanoaggregate Fragmentation and Restructuring during Supersonic Impaction based Thin Film Deposition Processes Souvik Ghosh, X. Chen, C. Li, B. Olson, C.J. Hogan, University of Minnesota, Minneapolis |
| 4:20pm | SE+AS+TF-WeA7 Invited Paper From Gas-ion to Metal-ion-controlled Irradiation: A Paradigm Shift in the Thin Film Growth by Magnetron Sputtering Grzegorz Greczynski, Linköping University, Sweden, I. Petrov, J.E. Greene, University of Illinois at Urbana-Champaign, L. Hultman, Linköping University, Sweden |
| 5:00pm | SE+AS+TF-WeA9 Atomic Layer Deposition of Silver Thin Film on Polydimethylsiloxane (PDMS) Sarah Hashemi Astaneh, C. Sukotjo, C.G. Takoudis, University of Illinois at Chicago |
| 5:20pm | SE+AS+TF-WeA10 Use of an Einzel Lens to Enhance Electrohydrodynamic Printing Technology Matthew Strohmayer, A. Dhall, P. Ramesh, N. Tokranova, C.A. Ventrice, Jr., SUNY Polytechnic Institute |