AVS 66th International Symposium & Exhibition
    Plasma Science and Technology Division Monday Sessions

Session PS+AS+EM+SS+TF-MoA
Plasma-Surface Interactions

Monday, October 21, 2019, 1:40 pm, Room B130
Moderators: Sebastian Engelmann, IBM T.J. Watson Research Center, Sumit Agarwal, Colorado School of Mines

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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:00pm PS+AS+EM+SS+TF-MoA2
Plasma Resistance of Sintered Yttrium Oxyfluoride (YOF) with Various Y, O, and F Composition Ratios
Tetsuya Goto, Y. Shiba, A. Teramoto, Tohoku University, Japan, Y. Kishi, Nippon Yttrium Co., Ltd, Japan, S. Sugawa, Tohoku University, Japan
2:20pm PS+AS+EM+SS+TF-MoA3 Invited Paper
Understanding Atomic Layer Etching: Thermodynamics, Kinetics and Surface Chemistry
Jane P. Chang, University of California, Los Angeles
3:00pm PS+AS+EM+SS+TF-MoA5
Comparison of Silicon Surface Chemistry between Photo-Assisted Etching and Ion-Assisted Etching
Emilia Hirsch, L. Du, V.M. Donnelly, D.J. Economou, University of Houston
3:20pm PS+AS+EM+SS+TF-MoA6
Chemical Reaction Probabilities in the Etching of Si by Fluorine Atoms Produced in a Mixture of NF­3/SF6 Plasma
Priyanka Arora, T. Nguyen, University of Houston, S. Nam, Samsung Electronic Company, Republic of Korea, V.M. Donnelly, University of Houston
4:00pm PS+AS+EM+SS+TF-MoA8 Invited Paper
John Thornton Memorial Award Lecture: Low Temperature Plasma-Materials Interactions: Foundations of Nanofabrication And Emerging Novel Applications At Atmospheric Pressure
Gottlieb S. Oehrlein, University of Maryland, College Park
4:40pm PS+AS+EM+SS+TF-MoA10
Determining Surface Recombination Probabilities during Plasma-enhanced ALD using Lateral High Aspect Ratio Structures
Karsten Arts, Eindhoven University of Technology, The Netherlands, M. Utriainen, VTT Technical Research Centre of Finland, R.L. Puurunen, Aalto University School of Chemical Engineering, Finland, W.M.M. Kessels, H.C.M. Knoops, Eindhoven University of Technology, The Netherlands
5:00pm PS+AS+EM+SS+TF-MoA11
Study of Plasma-Photoresist Interactions for Atomic Layer Etching Processes
Adam Pranda, K.-Y. Lin, G.S. Oehrlein, University of Maryland, College Park