| AVS 66th International Symposium & Exhibition | |
| Thin Films Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| TF-ThP1 Oxygen Partial Pressure Dependence of Structural and Photoluminescence Properties in Eu3+ doped Tantalum based Double-perovskite Thin Film Jung Hyun Jeong, J.H. Oh, B.C. Choi, J.H. Kim, S.Y. Seo, Pukyong National University, Republic of Korea, K. Jang, Changwon National University, Republic of Korea |
| TF-ThP2 Influence of the Crystal Structure on Photoluminescence Properties of Dy3+ and Pr3+ Doped Rare-earth Oxyorthosilicates (R2SiO5) (R = La, Gd, Y) Thin Film Phosphors S.N. Ogugua, H.C. Swart, University of the Free State, South Africa, O. Martin Ntwaeaborwa, University of the Witwatersrand, South Africa |
| TF-ThP4 Fabrication of IrO2/Pt Composite Films by Pulsed-dc Magnetron Sputtering and Plasma-enhanced Atomic Layer Deposition Chao-Te Lee, Y.-H. Yu, W.-H. Cho, W.-C. Chen, H.-P. Chen, Taiwan Instrument Research Institute, Taiwan |
| TF-ThP5 The Effect of Deposition Parameters on the Optical and Electrical Properties of MoO3/Ag/Mo/ MoO3 Films by Reactive rf Magnetron Sputtering C.-T. Lee, Wei-Chun Chen, H.-P. Chen, Taiwan Instrument Research Institute, Taiwan, C.-C. Jaing, Minghsin University of Science and Technology, Japan |
| TF-ThP6 Effect of Sintering Conditions on Characteristic of BaFe2(PO4)2 and Ceramic Target Production for Thin Films Jung Hwan Kim, B.S. Jung, J.H. Jeong, S.Y. Seo, Pukyong National University, Republic of Korea, K. Jang, Changwon National University, Republic of Korea |
| TF-ThP7 Development of Thin Film of Ferric Hydroxide Dispersed in Polymer Matrix Doped with Ethylenediamine S.H. Fernandes, Leandro Tiago Manera, H.J. Ceragioli, UNICAMP, Brazil |
| TF-ThP8 Dual-temperature Atomic Layer Deposition of HfO2/Al2O3 on In0.53Ga0.47As Changmin Lee, S. Choi, Y. An, W. Lee, W. Oh, D. Eom, J. Lee, H. Kim, Sungkyunkwan University, Republic of Korea |
| TF-ThP9 Conformal CVD of Hf1-xVxB2 from Two Precursors: Control of Composition x in Deep Trenches Kinsey Canova, G.S. Girolami, J.R. Abelson, University of Illinois at Urbana-Champaign |
| TF-ThP10 Catalyst-enhanced Chemical Vapor Deposition of Titanium-doped MgB2 Thin Films Xiaoqing Chu, Y. Yang, C. Caroff, G.S. Girolami, J.R. Abelson, University of Illinois at Urbana-Champaign |
| TF-ThP12 Kinetically Stabilized Growth of InN by MEPA-MOCVD G. Brendan Cross, Z. Ahmad, Georgia State University, D. Seidlitz, Technische Universität Berlin, Germany, M. Vernon, A.Y. Kozhanov, Georgia State University |
| TF-ThP13 Structure Characterization of PECVD a-SiCN:H Thin Films: Toward Machine Learning Algorithms for Modeling of Complex Disordered Solids Sai Siva Kumar Pinnepalli, C. Burkett, University of Missouri-Kansas City, J. Hwang, Ohio State University, O. Oyler, M.M. Paquette, University of Missouri-Kansas City |
| TF-ThP14 Growth of Hafnium Oxide and Zirconium Oxide for the Fabrication of Electronic Devices Using Plasma-Enhanced Atomic Layer Deposition Samuel Banks, K. Bell, S. Chance III, B. Rodgers, Z. Xiao, Alabama A&M University |
| TF-ThP15 Nanoscale Multilayered Thin-Film Thermoelectric Materials and Devices Joevonte Kimbrough, A. Glenn, A. Henderson, S. Budak, Z. Xiao, Alabama A&M University |
| TF-ThP18 Characterization of Fluorine-doped SiO2 Films Deposited by Magnetron Sputtering Bohuei Liao, Taiwan Instrument Research Institute, C.-N. Hsiao, Taiwan Instrument Research Institute, Taiwan, Republic of China |
| TF-ThP19 MOCVD Growth and Characterization of Wide Bandgap ZnGeN2 Thin Films Md Rezaul Karim, The Ohio State University, B.H.D. Jayatunga, Case Western Reserve University, Z. Feng, M. Zhu, J. Hwang, The Ohio State University, K. Kash, Case Western Reserve University, H. Zhao, The Ohio State University |
| TF-ThP20 Low Temperature Charging Dynamics of Ionic Liquid and Its Gating Effect on FeSe0.5Te0.5 Superconducting Films Cheng Zhang, University of Tennessee Knoxville, W. Zhao, S. Bi, Huazhong University of Science and Technology, China, C.M. Rouleau, J.D. Fowlkes, Oak Ridge National Laboratory, W.L. Boldman, University of Tennessee Knoxville, G. Gu, Q. Li, Brookhaven National Laboratory, G. Feng, Huazhong University of Science and Technology, P.D. Rack, University of Tennessee Knoxville |
| TF-ThP21 Design and Characterization of Nanomaterials using PREVAC’s Research Platforms Lukasz Walczak, PREVAC sp. z o.o., Poland |
| TF-ThP22 Deposition of the Porous Film on the Reactive Liquid Substrate via Metal-organic Precursors Haoming Yan, Q. Peng, University of Alabama |
| TF-ThP24 The Evolution of Atomic Layer Processing as a Field: Atomic Layer Etching,and its Connections with Atomic Layer Deposition Elsa Alvaro, Northwestern University, A. Yanguas-Gil, Argonne National Laboratory |
| TF-ThP25 Electrical Properties of In2O3 Thin-film Transistors under Vacuum and Inert Environments Keisuke Nakamura, K. Sasaki, Y. Shibata, K. Oe, S. Aikawa, Kogakuin University, Japan |
| TF-ThP26 Toward Ultra-fast Switching Speed Electrochromic Supercapacitor Weimin Jiao, S.C. Wei, C.R. Chang, F. Yao, University at Buffalo |
| TF-ThP27 Growth and Structure of Cr-doped ZnO Thin Films Gabrielle Pasternak, Washington and Jefferson College, A. Gardill, Lawrence University, S.E. Chamberlin, Washington and Jefferson College |
| TF-ThP28 Developing an Approach to Improve the Beta-phase in Ferroelectric PVDF-HFP Thin Films Ashley S. Dale, A. Mosey, J. Soruco, R. Cheng, Indiana University Purdue University Indianapolis |
| TF-ThP31 Size Dependent Strengthening in High Strength Nanotwinned Al/Ti Multilayers Yifan Zhang, S. Xue, Q. Li, J. Li, J. Ding, T.J. Niu, R.Z. Su, H. Wang, X. Zhang, Purdue University |