AVS 66th International Symposium & Exhibition | |
Thin Films Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:20pm | TF-TuA1 Invited Paper Flexible Hybrid Electronics Process Maturation using Printed Inks John D. Williams, The Boeing Company |
3:00pm | TF-TuA3 Large-Area Atmospheric Pressure Spatial ALD for Flexible OLED Display Applications C. Frijters, J. Smeltink, Huib Heezen, P. Poodt, SALDtech B.V., Netherlands |
3:20pm | TF-TuA4 Printed Polymer Heat Sinks for High-Power, Flexible Electronics Katherine Burzynski, University of Dayton, N.R. Glavin, E.M. Heckman, Air Force Research Laboratory, C. Muratore, University of Dayton |
4:20pm | TF-TuA7 Selective Deposition by Fast-ALD of Transparent Conductive Metal Oxides for Application in Organic (opto)electronic Devices M. Granados, D. Munoz-Rojas, LMGP, France, c. fontelaye, G. Nonglaton, Tony Maindron, CEA-LETI, France |
4:40pm | TF-TuA8 Photocatalytic Antibacterial Activity of ALD Thin Films on Fibrous Materials Halil Akyildiz, S. Diler, Uludag University, Turkey |
5:00pm | TF-TuA9 A Kinetic and Thermodynamic Study of Aromatic Compounds Interacting with Metal-Organic Framework Thin Films J. Shankwitz, D. Speed, D. Sinanan, Greg Szulczewski, University of Alabama |
5:20pm | TF-TuA10 Carbon’s Role in Reducing Alumina’s Resistivity Through Catalytic Carbon Nanotube Growth Berg Dodson, R.C. Davis, R.R. Vanfleet, Brigham Young University |
5:40pm | TF-TuA11 Ferroelectricity in Hafnia-Zirconia based Thin Films: Characterization and Applications Vineetha Mukundan, SUNY Polytechnic Institute, S. Consiglio, D.H. Triyoso, K. Tapily, R.D. Clark, G.J. Leusink, TEL Technology Center, America, LLC, J.H. Hazra, K. Beckmann, N.C. Cady, A.C. Diebold, SUNY Polytechnic Institute, Albany |
6:00pm | TF-TuA12 Atomic Layer Deposition-enabled Formation of Laser-Induced Graphene for Charged Membrane Applications David Bergsman, B.A. Getachew, J.C. Grossman, Massachusetts Institute of Technology |