| AVS 66th International Symposium & Exhibition | |
| Thin Films Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | TF+AS+EL+PS+RA-ThA1 Invited Paper Phase Separation in III-V Semiconductor Thin Films Mark Twigg, N.A. Mahadik, N.A. Kotulak, S. Tomasulo, M.K. Yakes, U.S. Naval Research Laboratory |
| 3:00pm | TF+AS+EL+PS+RA-ThA3 In-Situ Spectroscopic Monitoring of Methylamine-Induced Hybrid Perovskite Phase Transitions Jonathan Meyers, L.Y. Serafin, J.F. Cahoon, University of North Carolina at Chapel Hill |
| 4:00pm | TF+AS+EL+PS+RA-ThA6 Invited Paper Obtaining Smooth Surfaces and Measuring Surface Roughness Steven M. George, University of Colorado at Boulder |
| 4:40pm | TF+AS+EL+PS+RA-ThA8 Characterizing Ultra-thin Layer Growth and Area Selective Deposition using High Resolution Low Energy Ion Scattering (LEIS) Thomas Grehl, IONTOF GmbH, Germany, P. Brüner, ION-TOF GmbH, Germany, V. Pesce, B. Pelissier, R. Gassilloud, C. Vallée, Laboratoire des Technologies de la Microélectronique (LTM), France |
| 5:00pm | TF+AS+EL+PS+RA-ThA9 Real-Time Monitoring of Aluminum Oxidation Through Wide Band Gap MgF2 Layers for Protection of Space Mirrors B.I. Johnson, T.G. Avval, G. Hodges, K. Membreno, D.D. Allred, Matthew Linford, Brigham Young University |
| 5:20pm | TF+AS+EL+PS+RA-ThA10 Invited Paper Visualization of Ultrafast Charge Motion in Thin Films via THz Emission Spectroscopy Aaron Lindenberg, Stanford University |