| AVS 66th International Symposium & Exhibition | |
| Atomic Scale Processing Focus Topic | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | AP+BI+PS+TF-WeM1 Invited Paper Open Spaces in Al2O3 Film Deposited on Widegap Semiconductors Probed by Monoenergetic Positron Beams Akira Uedono, University of Tsukuba, Japan, T. Nabatame, NIMS, Japan, W. Egger, T. Koschine, Universität der Bundeswehr München, Germany, C. Hugenschmidt, M. Dickmann, Technische Universität München, Germany, M. Sumiya, NIMS, Japan, S. Ishibashi, AIST, Japan |
| 8:40am | AP+BI+PS+TF-WeM3 Surface Reaction Analyses of Atomic-layer Etching by Controlled Beam Experiments Kazuhiro Karahashi, T. Ito, S. Hamaguchi, Osaka University, Japan |
| 9:00am | AP+BI+PS+TF-WeM4 Surface Reaction Analysis of Fluorine-based Reactive Ion Etching (RIE) and Atomic Layer Etching (ALE) by Molecular Dynamics (MD) Simulation Erin Joy Tinacba, M. Isobe, K. Karahashi, S. Hamaguchi, Osaka University, Japan |
| 9:20am | AP+BI+PS+TF-WeM5 Analysis of Metal Surface during Atomic Layer Etching with Gas Cluster Ion Beam and Organic Acid Noriaki Toyoda, K. Uematsu, University of Hyogo, Japan |
| 9:40am | AP+BI+PS+TF-WeM6 In-situ Characterization of Growth Kinetics of Piezoelectric Films Grown by Atomic Layer Deposition Utilizing an Ultra-high Purity Process Environment Nicholas Strnad, General Technical Services, LLC, D.M. Potrepka, U.S. Army Research Laboratory, N. O'Toole, G.B. Rayner, Kurt J. Lesker Company, J.S. Pulskamp, U.S. Army Research Laboratory |
| 11:00am | AP+BI+PS+TF-WeM10 Invited Paper Nanoscale Surface Modification of Medical Devices using Accelerated Neutral Atom Beam Technology Dmitry Shashkov, J. Khoury, B. Phok, Exogenesis Corp. |
| 11:40am | AP+BI+PS+TF-WeM12 Chemically Enhanced Patterning of Nickel for Next Generation EUV Mask Xia (Gary) Sang, E. Chen, University of California, Los Angeles, T. Tronic, C. Choi, Intel Corporation, J.P. Chang, University of California, Los Angeles |
| 12:00pm | AP+BI+PS+TF-WeM13 Surface Reactions of Low Energy Electrons and Ions with Organometallic Precursors and their Relevance to Charged Particle Deposition Processes Rachel Thorman, Johns Hopkins University, E. Bilgilisoy, FAU Erlangen-Nürnberg, Germany, S. Matsuda, L. McElwee-White, University of Florida, D. Fairbrother, Johns Hopkins University |