AVS 52nd International Symposium, Wednesday, 11/2/2005 Sessions

Wednesday November 2, 2005 Sessions

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Room	WeM Wednesday, 11/2/05, 8:20am	WeL Wednesday, 11/2/05, 12:00pm	WeA Wednesday, 11/2/05, 2:00pm
200	SS1-WeM Growth and Alloying of Surfaces		SS1-WeA Surface Structure and Morphology Modification
201	VT-WeM Gas Flow and Pump Technology		VT-WeA Hydrogen, Outgassing, and Vacuum Systems
202	SS+EM-WeM Self-Assembled Monolayers		SS+EM-WeA Organic Film Growth and Characterization
203	SS2-WeM Reactions on Metals & Oxides		SS2-WeA Reactions on Nanoclusters
204	MI-WeM Magnetic Imaging and Spectroscopies		MI+EM-WeA Magnetic Semiconductors
206	AS-WeM Essential Tools for Surface Analysis		AS-WeA SIMS Cluster Probe Beams and General Topics
207	MS+MN+NS-WeM Advanced Manufacturing for Nano-scale Devices & Systems		MS-WeA Metrology & Process Control for Advanced Manufacturing
210	NS-WeM Nanometer Scale Imaging		NS-WeA Nanopatterning and Manipulation
302	PS+TF-WeM Plasma Enhanced CVD and ALD		PS-WeA Atmospheric Plasmas and Microdischarges
304	PS-WeM Advanced Gate Stack Fabrication
306	TF-WeM Mechanical and Tribological Properties of Thin Films		TF-WeA Fundamentals of Thin Films
309	EM+SS-WeM Contacts to Organic and Molecular Devices		EM-WeA Contacts to Semiconductors
310	TF+EM-WeM In-Situ/ Ex-Situ & Real- Time Monitoring
311	BI1-WeM Protein-Surface Interactions		BI1-WeA Protein-Surface Interactions
311a			BI2-WeA Cell-Surface Interactions
312	BI2-WeM Biomembranes and Spectroscopy
313
Exhibit Hall C&D		EW-WeL XPS and SPM New Developments and Applications