| AVS 52nd International Symposium | |
| Manufacturing Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | MS-WeA1 Optical Interferometric Microscope for Real-Time Monitoring and Control of Focused Ion Beam Processes D.P. Adams, M.B. Sinclair, T.M. Mayer, M.J. Vasile, W.C. Sweatt, Sandia National Laboratories |
| 2:20pm | MS-WeA2 Method for Creating Cross-Sectional TEM Single Crystal Diamond Samples using Focused Ion Beam and In-Situ Lift Out D.P. Hickey, E. Kuryliw, K.S. Jones, University of Florida |
| 2:40pm | MS-WeA3 Temperature and Film Thickness Sensor for Substrates with Multi-layered Thin Films using Optical Fiber type Low-coherence Interferometry T. Ohta, Wakayama University, Japan, K. Takeda, Nagoya University, Japan, M. Ito, Wakayama University, Japan, C. Koshimizu, Tokyo Electron AT LTD., Japan |
| 3:00pm | MS-WeA4 Endpointing Chamber Clean by Calorimetric Probing of Plasma Effluent I.S. Chen, J.W. Neuner, J.J. Welch, P.S.H. Chen, F. DiMeo, ATMI |
| 3:20pm | MS-WeA5 Sensing and Control Strategies for Spatially Programmable CVD Y. Cai, R. Sreenivasan, R. Adomaitis, G.W. Rubloff, University of Maryland |
| 3:40pm | MS-WeA6 High Resolution 2D dopant profiling of FinFET Structures and Silicon-based Devices using Scanning Probe Microscopies A.A. Khajetoorians, University of Texas at Austin, X.-D. Wang, Freescale Semiconductor Inc., J. Li, University of Texas at Austin, D. Pham, A.C. Diebold, International Sematech, C.K. Shih, University of Texas at Austin |