AVS 52nd International Symposium | |
Nanometer-Scale Science and Technology | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:00pm | NS-WeA1 Molecular Ruler Lithography Process with Sacrificial Multilayer Host Structures Incorporating a Barrier Layer S. Subramanian, J.M. Catchmark, Pennsylvania State University |
2:20pm | NS-WeA2 High Electric Field Nanoimprint Lithography of Metal Thin Films N. Farkas, P. Meduri, E.A. Evans, R.D. Ramsier, The University of Akron, J.A. Dagata, National Institute of Standards and Technology |
2:40pm | NS-WeA3 Thermolithography for Micro- and Nanofabrication M.-T. Hung, Y.S. Ju, UCLA |
3:00pm | NS-WeA4 Direct Deposition of Molecular Electronics Materials using Thermal DPN P.E. Sheehan, M. Yang, A.R. Laracuente, Naval Research Laboratory, B.A. Nelson, W.P. King, Georgia Tech, L.J. Whitman, Naval Research Laboratory |
3:20pm | NS-WeA5 Invited Paper Physical Processes in Atom Manipulation and Creation of Novel Nanostructures of Co and Cu Atoms on Cu(111) Surfaces* J.A. Stroscio, R.J. Celotta, NIST |
4:00pm | NS-WeA7 Chemically Engineering the Motion of Individual Molecules on the Si(100)-2x1 Surface: a Scanning Tunneling Microscopy Study R. Basu, J.D. Tovar, M.C. Hersam, Northwestern University |
4:20pm | NS-WeA8 Formation of Large-Area Nanostructures on Si and Ge Surfaces during Low-Energy Ion Beam Erosion B. Ziberi, F. Frost, B. Rauschenbach, Leibniz-Institut für Oberflächenmodifizierung e.V. Leipzig, Germany |
4:40pm | NS-WeA9 Thermally Assisted Atom Transfer on Surfaces: Between Tunneling and Activated Diffusion J.W. Gadzuk, NIST |
5:00pm | NS-WeA10 Patterning of Well-Ordered PZT Nanodot Arrays using Silicon Nitride Shadow Mask H.-J. Shin, J.H. Choi, H. Yang, Y.D. Park, Y. Kuk, Seoul National University, Korea, C.J. Kang, Myungji University, Korea |