| AVS 52nd International Symposium | |
| Thin Films | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | TF+EM-WeM1 Invited Paper In-situ Infrared Absorption Spectroscopy of High-k Dielectrics Growth on Semiconductors Y.J. Chabal, S. Rivillon, Y. Wang, K. Bratland, M.-T. Ho, Rutgers University |
| 9:00am | TF+EM-WeM3 Real-time Sensing for Process Dynamics and Metrology in Tungsten Atomic Layer Deposition L. Henn-Lecordier, W. Lei, G.W. Rubloff, University of Maryland |
| 9:20am | TF+EM-WeM4 Twin Boundaries can be Moved by Step Edges during Film Growth N.C. Bartelt, W.L. Ling, K.F. McCarty, Sandia National Laboratories, C.B. Carter, University of Minnesota |
| 9:40am | TF+EM-WeM5 Invited Paper In-Situ Real Time Spectroscopic Ellipsometry Studies of the Growth of Amorphous and Epitaxial Silicon for Photovoltaic Applications D.H. Levi, C.W. Teplin, E. Iwaniczko, Y. Yan, T.H. Wang, H.M. Branz, National Renewable Energy Laboratory |
| 10:20am | TF+EM-WeM7 Analytic First-Order Solution for the Simultaneous Determination of Complex Refractive Indices and Thicknesses of Thin Films Deposited on Substrates I.K. Kim, D.E. Aspnes, North Carolina State University |
| 10:40am | TF+EM-WeM8 Invited Paper Linear Nanomechanical Measurements using a Novel AFM Technique P.M. Hoffmann, Wayne State University |