| IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11) | |
| Thin Films | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| TF-ThP1 Substrate Response During Dual Bipolar Pulsed Sputtering P.J. Kelly, J. O'Brien, University of Salford, U.K., J.W. Bradley, UMIST, U.K., P.S. Henderson, University of Salford, U.K., R. Hall, Advanced Energy Industries UK Ltd. |
| TF-ThP2 Modified HFCVD System for Diamond Coatings on Dental Burrs H. Stein, W. Ahmed, C.A. Rego, N. Ali, Manchester Metropolitan University, U.K. |
| TF-ThP3 High Rate Deposition of Thick CrNx Films by Unbalanced Magnetron Sputtering K.H. Nam, J.H. Bin, J.G. Han, Sungkyunkwan University, Korea |
| TF-ThP4 Comparison of Poly-Si Films Deposited by UHVCVD and LPCVD and Its Application for Thin Film Transistors D.Z. Peng, H.W. Zan, National Chiao Tung University, Taiwan, T.C. Chang, National Sun Yat-Sen University, Taiwan, C.Y. Chang, P.S. Shih, National Chiao Tung University, Taiwan |
| TF-ThP5 Oxygen Partial Pressure Effect on the Properties of the Novel Semiconducting Alloy Cu@sub x@Cd@sub 1-x@Te Grown by rf Sputtering J. Santos-Cruz, G. Torres-Delgado, O. Jiménez-Sandoval, R. Castanedo-Pérez, Cinvestav-IPN, Unidad Querétaro, Mexico, B.S. Chao, Energy Conversion Devices, Inc., P. García-Jiménez, S. Jiménez-Sandoval, Cinvestav-IPN, Unidad Querétaro, Mexico |
| TF-ThP6 Reactive Dual Magnetron Sputtering Technology for Oxide Dielectric Film Deposition S. Xu, HIVAC Technology(GROUP) CO. LTD, P.R. China, X. Hou, Tsinghua University, P.R. China, C. Fan, HIVAC Technology(GROUP) CO. LTD, P.R. China, L. Zhao, L. Cha, Tsinghua University, P.R. China |
| TF-ThP7 Copper Metallization for ULSI Using 90°-bend Magnetic Filtered Cathodic Arc Evaporation Plasma System J.-H. Lin, U.-S. Chen, W.-J. Hsieh, H.C. Shih, National Tsing Hua University, Taiwan |
| TF-ThP8 Velocities and Ionization Degree of Vapor Stream Produced from Evaporation Source using Porous Rod by Electron Beam Heating H.M. Ohba, T. Shibata, Japan Atomic Energy Research Institute |
| TF-ThP9 Effects of Plasma Exposure on Structural and Optical Properties of TiO@sub2@ Films Deposited by Facing Targets Sputtering T. Takahashi, H. Nakabayashi, N. Sasai, K. Masugata, Toyama University, Japan |
| TF-ThP10 High Rate Deposition of TiO@sub 2@, TiN, and TiO@sub 2@/TiN/TiO@sub 2@ Thin Films Using New High Power Magnetron Sputtering Source and Comparison with Its Optical Characteristics M.J. Jung, H.Y. Lee, Y.-S. Sin, J.G. Han, J.-H. Boo, Sungkyunkwan University, Korea |
| TF-ThP11 Deposition of Dielectric Films by Photo Chemical Vapor Deposition using Vacuum Ultraviolet Xe2 Excimer Lamp from Tetraethoxysilane N. Horii, A. Inouye, H. Nishibata, Fukui National College of Technology, Japan, K. Okimura, Tokai University, Japan |
| TF-ThP12 Bahaviours of Energetic Oxygen Particles in the Reactive Sputtering of Zr Target in Oxygen Atmosphere K. Tominaga, T. Kikuma, K. Kusaka, T. Hanabusa, The University of Tokushima, Japan |
| TF-ThP13 In-situ Fabrication of Polycrystalline Thin Film Cathodes for Secondary Thin Film Batteries using Radio Frequency Sputter Deposition K.-F. Chiu, F.C. Hsu, M.K. Wu, T.-P. Perng, National Tsing Hua University, Taiwan |
| TF-ThP14 Effects of Deposition Parameters and Physical Properties of Thin NiO Films on Gas Sensing Characteristics I. Hotovy, Slovak University of Technology Bratislava, Slovakia, L. Spiess, Technical University of Ilmenau, Germany, P. Siciliano, S. Capone, IME-CNR Lecce, Italy |
| TF-ThP16 Computer Modeling of Thin Metal Films for Advanced Devices L He, San Jose State University |
| TF-ThP18 Structural Stability of Amorphous Al78W22 Thin Films Below Crystallization Temperature N. Radic, Rudjer Boskovic Institute, Croatia, J. Ivkov, Institute of Physics, Croatia, A. Tonejc, Faculty of Sciences, Croatia, T. Car, Rudjer Boskovic Institute, Croatia |
| TF-ThP19 Composite Ti/C:H Films and Their Potential Application H. Biederman, D. Slavinska, H. Boldyreva, S. Gretchany, Charles University, Czech Republic, S. Kvasnica, Boltzmann Inst. for Biomedical Microtechnology and Vienna Univ. of Tech., Austria, W. Fallmann, Vienna University of Technology, Austria, L. Bacakova, V. Stary, Academy of Sciences of the Czech Republic |
| TF-ThP20 The Effect of Substrate Bias and Nitrogen Incorporation on the Diamond-like Carbon Film Depositions by 90°-bend Magnetic Filtered Cathodic Arc Evaporation Plasma W.-J. Hsieh, J.-H. Lin, P.-S. Shih, X.-W. Liu, H.C. Shih, National Tsing Hua University, Taiwan |
| TF-ThP21 DLC Thin Films Characterized by AES, XPS and EELS E.C. Samano, G. Soto, L. Cota, CCMC-UNAM, Mexico |
| TF-ThP22 Physical Properties of Nitrogen Doped Diamond-Like Amorphous Carbon Films Deposited by Supermagnetron Plasma CVD H. Kinoshita, N. Otaka, Shizuoka University, Japan |
| TF-ThP23 Fabrication of Diamond Photocathode of Transmissive Type K. Kato, K. Ito, M. Hiramatsu, M. Nawata, Meijo University, Japan, C.H. Lau, A. Bennett, J. Foord, University of Oxford, UK, R. Jackman, University College London, UK |
| TF-ThP24 Fabrication of Carbon Whisker Film Using RF Plasma CVD K. Ito, K. Kato, M. Hiramatsu, M. Nawata, Meijo University, Japan, M. Hori, Nagoya University, Japan, C.H. Lau, J. Foord, University of Oxford, UK |
| TF-ThP26 Effect of Ar Addition on Microstructure and Composition of Nitrogen Containing Carbon Films Prepared by Hot Filament CVD Y. Watanabe, A. Yamazaki, N. Kitazawa, Y. Nakamura, National Defense Academy, Japan |