IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Thin Films Thursday Sessions
       Session TF-ThP

Paper TF-ThP6
Reactive Dual Magnetron Sputtering Technology for Oxide Dielectric Film Deposition

Thursday, November 1, 2001, 5:30 pm, Room 134/135

Session: Thin Film Deposition/Carbon-Containing Films Poster Session
Presenter: S. Xu, HIVAC Technology(GROUP) CO. LTD, P.R. China
Authors: S. Xu, HIVAC Technology(GROUP) CO. LTD, P.R. China
X. Hou, Tsinghua University, P.R. China
C. Fan, HIVAC Technology(GROUP) CO. LTD, P.R. China
L. Zhao, Tsinghua University, P.R. China
L. Cha, Tsinghua University, P.R. China
Correspondent: Click to Email
A study on oxide dielectric film deposition by medium frequency (MF) reactive dual magnetron sputtering (DMS) is reported in this paper. A continuous system for large-area deposition by DMS has been developed more than two years ago. The operation state of the DMS depends on the hysteresis curve of the target voltage with respect to the reactive gas (O@sub 2@) flow rate. The process was controlled by adjusting O@sub 2@ flow based on the target voltage in the closed-loop. Possible mechanism of physical and chemical processes on the target/substrate surface has been discussed. Based on the detailed experimental studies, criteria of the operation point according to the hysteresis were summarized. It was shown that magnetic field profile, distance between the two targets, structure of the shield, arrangement of the pipes for reactive gas supply and direction of the O@sub 2@ flow have strong influence on the time constant and film quality as well as the precision and stability of the feedback closed-loop. Characteristics of deposited SiO@sub 2@, Al@sub 2@O@sub 3@ and TiO@sub 2@ films have been evaluated, including thickness, uniformity, surface topography, crystal structure, stoichiometric composition, refractive index and transmittance, etc. Long term operation confirmed that uniform, dense and amorphous optical film could be deposited rapidly and stably.