IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Thin Films Thursday Sessions
       Session TF-ThP

Paper TF-ThP12
Bahaviours of Energetic Oxygen Particles in the Reactive Sputtering of Zr Target in Oxygen Atmosphere

Thursday, November 1, 2001, 5:30 pm, Room 134/135

Session: Thin Film Deposition/Carbon-Containing Films Poster Session
Presenter: K. Tominaga, The University of Tokushima, Japan
Authors: K. Tominaga, The University of Tokushima, Japan
T. Kikuma, The University of Tokushima, Japan
K. Kusaka, The University of Tokushima, Japan
T. Hanabusa, The University of Tokushima, Japan
Correspondent: Click to Email
ZrO@sub@2 films were deposited in oxygen atmosphere with conventional planar magnetron sputtering system. In a sputtering of oxide target, energetic negative oxygen ions and energetic neutral oxygen atoms are bombarding the film. Then energetic oxygen ion s are generated in cathodefall in front of an oxide target. Precauser of the energetic neutral atoms is the negative oxygen ions that are accelerated in the cathode fall. These energetic particles bombard depositing oxide film and degrade film qualities s uch as internal stress, insulative characteristics. However, these energetic particles in a reactive sputtering is not so clear, especially in cases of materials such as Zr that is active with oxygen. We investigated the degree of the energetic oxygen particles in ZrO@sub2@ deposition and the generation mechanism of the energetic oxygen particles. Strong energetic oxygen ions generated in the sputtering of the Zr oxide target in O@sub2@ atmosphere were ascribed to the strong oxidization at the Zr surface. The energetic negative oxygen ions were detected using a probe constructed here. At the same time, the photoemission intensity from the sputtered Zr atoms was observed in order to monitor the target surface oxidization. The results show that the Zr targe t is very active with the oxidization of the target surface and drastically oxidized in a metal mode sputtering. The strong negative oxygen ions in an oxide mode sputtering are due to the generation of thick Zr-oxide layer on the Zr target. At the same time, films were prepared by the two sputtering modes and the relation the film properties and the energetic oxygen ions were investigated.