IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Thin Films Thursday Sessions
       Session TF-ThP

Paper TF-ThP26
Effect of Ar Addition on Microstructure and Composition of Nitrogen Containing Carbon Films Prepared by Hot Filament CVD

Thursday, November 1, 2001, 5:30 pm, Room 134/135

Session: Thin Film Deposition/Carbon-Containing Films Poster Session
Presenter: Y. Watanabe, National Defense Academy, Japan
Authors: Y. Watanabe, National Defense Academy, Japan
A. Yamazaki, National Defense Academy, Japan
N. Kitazawa, National Defense Academy, Japan
Y. Nakamura, National Defense Academy, Japan
Correspondent: Click to Email
Nitrogen containing amorphous carbon (a-CNx) films were synthesized on Si (100) substrates by hot filament chemical vapor deposition method using a carbon filament, which supplies carbon and heat. Deposition was performed in low pressure atmosphere of pure nitrogen and a gas mixture of nitrogen and argon. Effects of argon addition on film microstructures and composition were studied by changing the argon fraction under the total pressure of 100 Pa. The film microstructure was observed by field-emission scanning electron microscope (FE-SEM) and the composition was analyzed by X-ray photoelectron spectroscopy (XPS). FE-SEM observations reveal that films prepared in pure nitrogen atmosphere show a columnar structure, while the films change to tapered structure with argon addition. Spectra of XPS show that the films were composed of carbon and nitrogen, and no contamination was observed except a small amount of oxygen. It is also found that the nitrogen concentration in films increases in dependence on argon partial pressure.