IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Thin Films Thursday Sessions
       Session TF-ThP

Paper TF-ThP9
Effects of Plasma Exposure on Structural and Optical Properties of TiO@sub2@ Films Deposited by Facing Targets Sputtering

Thursday, November 1, 2001, 5:30 pm, Room 134/135

Session: Thin Film Deposition/Carbon-Containing Films Poster Session
Presenter: T. Takahashi, Toyama University, Japan
Authors: T. Takahashi, Toyama University, Japan
H. Nakabayashi, Toyama University, Japan
N. Sasai, Toyama University, Japan
K. Masugata, Toyama University, Japan
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In sputtered films, it is very important to investigate the influence of plasma exposure to the substrate because the properties of films strongly depend on the plasma state. So, in this study, TiO@sub2@ films have been deposited at different substrate positions using the facing targets sputtering which can easily vary the degree of plasma exposure. The plasma was confined sufficiently between two Ti targets faced each other. The substrates were placed at a certain distance from the middle of a straight line connecting the centers of the targets' planes. TiO@sub2@ films with thickness of about 2-3 µm were reactively deposited on glass-slide substrates. The crystal structure, and optical properties of films were measured using a X-ray diffractometry and a Raman spectroscopy, and a spectrophotometer, respectively. The A(101), A(200), A(112) and A(220) peaks were observed from the X-ray diffraction patterns, where A shows an anatase of TiO@sub2@. With increasing plasma exposure, X-ray peak intensities I@subP@ of A(101) and A(200) gradually decreased, and I@subP@ of A(112) and A(220) gradually increased, respectively. I@subP@ significantly depended on the substrate position in this study. Moreover, A(220) peak was significantly higher than others and the TiO@sub2@ crystallites became larger with an increase of plasma exposure. TiO@sub2@ films also showed anatase from the Raman spectra with Raman shift of 145 cm@super-1@. With decreasing plasma exposure, the changes in the optical transmittance spectra of TiO@sub2@ films were very small at the wavelength of 350-900 nm. However, the transmittance spectra significantly depended on the wavelength with increasing plasma exposure. The transmittance monotonically decreased with decreasing wavelength in the range of 700 to 350 nm. Consequently, it was found that crystal structure and optical properties of TiO@sub2@ films were strongly affected to plasma exposure during deposition.