IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Thin Films Thursday Sessions
       Session TF-ThP

Paper TF-ThP3
High Rate Deposition of Thick CrNx Films by Unbalanced Magnetron Sputtering

Thursday, November 1, 2001, 5:30 pm, Room 134/135

Session: Thin Film Deposition/Carbon-Containing Films Poster Session
Presenter: K.H. Nam, Sungkyunkwan University, Korea
Authors: K.H. Nam, Sungkyunkwan University, Korea
J.H. Bin, Sungkyunkwan University, Korea
J.G. Han, Sungkyunkwan University, Korea
Correspondent: Click to Email
The high rate deposition processes such as high current arc, laser arc, hollow cathode discharge ion plating and magnetron sputtering method have been developed for cost effective industrial applications. Especially magnetron sputtering is emerging a very efficient method for high rate deposition of dense thin films. In previous works, we have synthesized CrNx films by magnetron sputtering. The deposition rate was reached to be about 0.6µ/min. and the microhardness was evaluated up to 2200kg/mm2. And then phase and microstructure were controlled by change of N2 partial pressure and pulsed DC bias. In this study, high rate deposition of thick CrNx films was carried out by magnetron sputtering for the special application such as piston ring employed in automobile engine. For the high rate deposition of CrNx films with thickness of 30µ, residual stress in films was controlled by various N2 partial pressure, target power density and bias in processing. The microstructure was analyzed by X-ray Diffraction(XRD) and Scanning Electron Microscopy(SEM) and mechanical properties were evaluated by microhardness test, residual stress and adhesion tests.