IUVSTA 15th International Vacuum Congress (IVC-15), AVS 48th International Symposium (AVS-48), 11th International Conference on Solid Surfaces (ICSS-11)
    Thin Films Thursday Sessions
       Session TF-ThP

Paper TF-ThP2
Modified HFCVD System for Diamond Coatings on Dental Burrs

Thursday, November 1, 2001, 5:30 pm, Room 134/135

Session: Thin Film Deposition/Carbon-Containing Films Poster Session
Presenter: W. Ahmed, Manchester Metropolitan University, U.K.
Authors: H. Stein, Manchester Metropolitan University, U.K.
W. Ahmed, Manchester Metropolitan University, U.K.
C.A. Rego, Manchester Metropolitan University, U.K.
N. Ali, Manchester Metropolitan University, U.K.
Correspondent: Click to Email
Chemical vapour deposited diamond films grown in a modified hot filament reactor using filament metals such as tantalum and tungsten have been optmised. The non-planar e.g. a small dental burrs or small metal abrading device was used as a substrate. The filament in hot filament chemical vapour deposition "HFCVD" plays an essential role in creating the gas phase species that enable and influence the diamond growth. The modification of HFCVD was such that the coiled filament was fixed vertically within the vacuum deposition chamber as opposed to horizontal position as used in conventional HFCVD systems. The dental burrs were placed within the coiled filament during deposition and this was the distinctive feature of the system. The substrate varied from 0.5mm to 1.25mm in diameter and were as long as 20mm. The as-grown diamond films were found to be polycrystalline, uniform and the film coverage was good. A preferential diamond (111) surface morphology has been obtained which is srongly dependent on diamond growth paramaters, including substrate and filament position in the reactor. Raman spectroscopy and scanning electron microscopy measurements confrimed the good quality of the obtained diamond films.