| AVS 52nd International Symposium | |
| Thin Films | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| TF-MoP2 Effects of Annealing Gas on Characteristics of HfO@sub 2@ Deposited by ALD for MIM Capacitors S.-W. Jeong, H.J. Lee, K.-S. Kim, M.-T. Yoo, Y.-H. Roh, Sungkyunkwan University, Korea, T. Noguchi, J. Jung, W. Xianyu, Samsung Advanced Institute of Technology, Korea |
| TF-MoP3 The Annealing Effect on the Diamond-Like Carbon Protective Antireflection Coating W.S. Choi, K. Kim, J. Yi, B. Hong, Sungkyunkwan University, Korea |
| TF-MoP5 Metalorganic Chemical Vapor Deposition and Characterization of Zr-silicate Gate Dielectrics J. Kim, S. Lee, K. Yong, POSTECH, Korea |
| TF-MoP6 Isotopically Concentrated Silicon Film Formation by Chemical Vapor Deposition H. Yamamoto, H. Ohba, Japan Atomic Energy Research Institute, M. Sasase, The Wakasa-wan Energy Research Center, Japan, K. Yamaguchi, K. Shimura, S. Shamoto, A. Yokoyama, K. Hojou, Japan Atomic Energy Research Institute |
| TF-MoP7 SiN Single Passivation Layer Grown by Linear Antenna Type Inductively-Coupled-Plasma Chemical Vapor Deposition for Top-Emitting Organic Light Emitting Diodes H.-K. Kim, M.S. Kim, K.-S. Lee, S.H. Jeong, K. Kim, Samsung SDI |
| TF-MoP8 Effect of Hydrogen Dilution on Microstructure of In Situ Polycrystalline Si Film Grown by Catalyzer Enhanced Chemical Vapor Deposition M.S. Kim, H.-K. Kim, Samsung SDI |
| TF-MoP9 Irradiation Effect of Nitrogen Ion Beam on Hydrogenated Amorphous Carbon Films Y. Watanabe, S. Katoh, N. Kitazawa, National Defense Academy, Japan |
| TF-MoP10 Fabrication of Micropatterned Mesoporpous Silica Films on a Flexible Polymer Substrate Through a Pattern Transfer and Subsequent Photocalcination A. Hozumi, M. Inagaki, Y. Yokogawa, T. Kizuki, AIST, Japan, N. Shirahata, NIMS, Japan |
| TF-MoP11 XPS and FTIR Characterization of C60 States in C60 Doped Conducting Polymers H. Kato, S. Takemura, K. Iwasaki, N. Nanba, T. Hiramatsu, Kanto Gakuin University, Japan, O. Nishikawa, M. Taniguchi, Kanazawa Institute of Technology, Japan |
| TF-MoP12 XPS Characterization of Electrochemical Growth of Conducting Polymer on Oxidized Si Surface H. Kato, S. Takemura, N. Takakuwa, K. Ninomiya, T. Watanabe, N. Nanba, T. Hiramatsu, Kanto Gakuin University, Japan |
| TF-MoP13 Controlled Synthesis and Magnetic Properties of Iron Oxide Particles Formed by Thermal Decomposition of Rapidly Expanded Supercritical Solutions S. De Dea, D. Graziani, D.R. Miller, R.E. Continetti, University of California, San Diego |
| TF-MoP14 Growth of Novel NaCdF@sub3@ Thin Films by Pulsed Laser Deposition for Advanced Ferroelectric Applications T. Aburada, C.T. Nelson, University of Virginia, R.W. Smith, University of Nebraska-Omaha, S.B. Qadri, US Naval Research Laboratory, J.M. Fitz-Gerald, University of Virginia |
| TF-MoP15 Low Temperature Formation of High-Quality SiO@sub 2@ Thin Film using UV Light-Excited Ozone A. Tosaka, National Institute of Advanced Industrial Science and Technology, Japan, T. Nishiguchi, Meidensha Corporation, Japan, H. Nonaka, S. Ichimura, National Institute of Advanced Industrial Science and Technology, Japan |
| TF-MoP16 Influences of the Dopant Concentration and Thermal Treatment on Optical and Electrical Properties of C-oriented Aluminum-Doped Zinc Oxide Films S.-Y. Kuo, National Applied Research Laboratories, Taiwan, W.-C. Chen, National Taiwan Normal University, Taiwan, C.Y. Su, National Applied Research Laboratories, Taiwan, C.-P. Cheng, National Taiwan Normal University, Taiwan |
| TF-MoP18 Electrical, Optical and Structural Properties of Arsenic-doped (Zn,Mg)O Films J.-M. Erie, Y.J. Li, H. Kim, K Ip, S.J. Pearton, V. Cracium, D.P. Norton, J. Chen, F. Ren, I. Kravchenko, University of Florida |
| TF-MoP19 Fe(001) Thin Films for Novel Applications C.A. Meserole, G.L. Fisher, D.J. Hilton, R.D. Averitt, D.J. Funk, A.J. Taylor, Los Alamos National Laboratory |
| TF-MoP20 Electron Cyclotron Resonance Remote Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films E.-J. Lee, B.-Y. Kim, S.K. Park, H.-D. Kim, J.-W. Park, M.-G. Ko, Hanyang University, South Korea |
| TF-MoP22 Experimental AES and Computer Model Based Elemental Depth-Profile Analysis of Tungsten Carbide Doped Diamond Like Carbon Films J.A. Carlson, J. Abou-Hanna, J. Lozano, Bradley University |
| TF-MoP23 Improvement of Surface Roughness in Indium Tin Oxide (ITO) Anode for Organic Light-Emitting Diode (OLED) by Water Vapor Injected Radio Frequency Sputtering K.-S. Lee, D.-G. Kim, H.-K. Kim, Samsung SDI |
| TF-MoP24 Characteristics of Indium Zinc Oxide Top Cathode Layer Prepared by Box Cathode Sputtering for Top-Emitting Organic Light-Emitting Diodes H.-K. Kim, D.-G. Kim, K.-S. Lee, Samsung SDI |
| TF-MoP26 Fabrication of Long Lengths of Flexible High Temperature Superconductor Thin Film Tapes for Electric Power Applications V. Selvamanickam, Y. Chen, X. Xiong, Y. Li, Y. Xie, Y. Qiao, J. Reeves, P. Hou, M. Gardner, T. Salagaj, K. Lenseth, SuperPower |
| TF-MoP27 Flexible Gas Barrier Coatings Based on Roll-to-Roll Symmetric Magnetron Sputtering C.-S. Wang, K. Sasaki, Kanazawa University, Japan, S.-F. Chen, National Taipei University of Technology, Taiwan, T. Hata, Japan Science and Technology Agency |
| TF-MoP28 Sputtering of Y3Al5O12:Cr Thin Films for Temperature Sensor Applications Y. Deng, P.D. Rack, University of Tennessee |
| TF-MoP29 Film Properties of Transparent Conductive Oxide Films Deposited from Either ZnO- In@sub2@O@sub 3@or ZnO-SnO@sub2@ Systems with Additional Ga@sub2@O@sub3@ Impurities K. Tominaga, D. Takada, Y. Sukeda, Y. Nishimura, T. Moriga, I. Nakabayashi, Tokushima University, Japan |
| TF-MoP31 Palladium Oxide Composite Films Containing Palladium Metal Phase Fabricated by Reactive Ion Beam Sputter-Deposition T. Ichinohe, S. Masaki, Tokyo National College of Technology, Japan, K. Kawasaki, TDY Co., Ltd., Japan |
| TF-MoP32 Growth and Properties of CdTeO@sub x@ Films by Reactive rf Magnetron Sputtering: CdTeO@sub 3@ a High-quality Transparent Material for Solar Cell Applications S. Jiménez-Sandoval, Centro de Investigación y de Estudios Avanzados del IPN, Mexico, J. Carmona-Rodríguez, R. Lozada-Morales, Benemérita Universidad Autónoma de Puebla, Mexico, O. Jiménez-Sandoval, M. Meléndez-Lira, C.I. Zúniga-Romero, Centro de Investigación y de Estudios Avanzados del IPN, Mexico |
| TF-MoP34 Electron Beam Induced Processing of Nanoscale Features: Process Parameters, Simulated Growth, and Nanoscale Applications P.D. Rack, J.D. Fowlkes, S.J. Randolph, University of Tennessee |
| TF-MoP35 Influence of Sputtering target Structure on the Deposited Film Properties C.F. Lo, Praxair Surface Technologies - MRC |
| TF-MoP36 Reactive Pulsed DC Magnetron Sputtering of Oxide Films M. Ye, Applied Materials, Inc. |
| TF-MoP37 Synthesis and Characterization of SiN@sub x@ Films Deposited on Silicon by Reactive RF Sputtering@super *@ C. Mendoza-Barrera, E. Valaguez, UPIITA-IPN, México, A. Garcia-Sotelo, V. Altuzar, M. Melendez-Lira, A. Mendoza-Galván, S. Jiménez-Sandoval, Cinvestav-IPN, México |
| TF-MoP38 Optical and Charge Transport Properties of p-type (CdTe)@sub x@Cu@sub y@O@sub z@ Films: a Novel Material for Photovoltaics and other Optoelectronic Applications S. Jiménez-Sandoval, Cinvestav-IPN, Mexico, J. Carmona-Rodríguez, Benemérita Univerisidad Autónoma de Puebla, Mexico, O. Jiménez-Sandoval, Cinvestav-IPN, Mexico, R. Lozada-Morales, Benemérita Universidad Autónoma de Puebla, Mexico, M. Meléndez-Lira, C.I. Zúniga-Romero, Cinvestav-IPN, Mexico |
| TF-MoP39 Influence of Ga Doping Level on the Properties of ZnO-Gax Films prepared by Radio Frequency Magnetron Sputtering H.C. Pan, C.Y. Su, C.N. Hsiao, National Applied Research Laboratories, Taiwan, S.-P. Lin, C.-S. Chiou, Yuan Ze University, Taiwan |
| TF-MoP41 The Effect of Ion-beam Assisted Deposition on the Electrical Properties of Indium Zinc Oxide Thin Films Investigated by Conducting Atomic Force Microscopy C.Y. Su, National Applied Research Laboratories, Taiwan, H.C. Pan, National Applied Research Laboratories, M.H. Shiao, C.N. Hsiao, K.N. Lee, National Applied Research Laboratories, Taiwan |
| TF-MoP42 Optical and Electrical Properties of Sc-doped ZnO Thin Films Prepared by RF Magnetron Sputtering M.H. Shiao, National Applied Research Laboratories, Taiwan, C.C. Jaing, Y.J. Huang, Ming Hsin University of Science & Technology, Taiwan, H.C. Pan, C.Y. Su, C.N. Hsiao, K.N. Lee, National Applied Research Laboratories, Taiwan |
| TF-MoP43 Characteristics of High-k Gate Dielectric Formed by Oxidation of Multi-layered Metal Films Deposited Directly on the Si Substrate by Sputtering M.T. You, S.-W. Jeong, H.J. Lee, Y.-H. Roh, Sungkyunkwan University, Korea |
| TF-MoP44 Characterization of Barium Zirconium Titanate Thin Films as Tunable Materials Prepared by rf Magnetron Sputtering W.-A. Lan, T.-B. Wu, National Tsing Hua University, Taiwan, R.O.C. |
| TF-MoP45 Electrical and Optical Characteristics of MIS Structure using the a-C and a-C:H Films Grown by Closed-Field Unbalanced Magnetron Sputtering Y.S. Park, B. Hong, Sungkyunkwan University, Korea |
| TF-MoP47 Thermochromic La@sub 1-x@Sr@sub x@MnO@sub 3@ (x = 0.1, 0.175, and 0.3) Smart Coatings Grown by Reactive Pulsed Laser Deposition M. Soltani, M. Chaker, INRS-Energie, Matériaux et Télécommunications, Canada, X.X. Jiang, D. Nikanpour, Canadian Space Agency, Canada, J. Margot, Université de Montréal, Canada |
| TF-MoP48 TiN and TiO@sub2@:Nb Thin Film Preparation using Hollow Cathode Sputtering with Application to Solar Cells S.Y. Guo, Energy Photovoltaics, Inc., W.N. Shafarman, University of Delaware, A.E. Delahoy, Energy Photovoltaics, Inc. |
| TF-MoP49 Optical Constants of (CdTe)@sub 1-x@Al@sub x@x Thin Films J. Jimenez Montecinos, UAM-Azc., Mexico, A. Mendoza-Galvan, Cinvestav-IPN, Mexico, M. Zapata-Torres, CICATA-IPN, Mexico, S. Jimenez-Sandoval, M. Melendez-Lira, Cinvestav-IPN, Mexico |
| TF-MoP50 Inhomogeneous Rarefaction of the Process Gas in a Direct Current Magnetron Sputtering System F.J. Jimenez, S.D. Ekpe, S.K. Dew, University of Alberta, Canada |
| TF-MoP51 Influence of Flux Anisotropy on Microstructure of Sputter Deposited Cr Films S.Yu. Grachev, J.-D. Kamminga, G.C.A.M. Janssen, Netherlands Institute of Metals Research, the Netherlands |
| TF-MoP52 Plasma Diagnostics of Inductively Coupled Plasma Assisted Magnetron Sputtering for Reactive Deposition of MgO J. Joo, Kunsan National University, Korea |