AVS 52nd International Symposium
    Thin Films Monday Sessions
       Session TF-MoP

Paper TF-MoP45
Electrical and Optical Characteristics of MIS Structure using the a-C and a-C:H Films Grown by Closed-Field Unbalanced Magnetron Sputtering

Monday, October 31, 2005, 5:00 pm, Room Exhibit Hall C&D

Session: Aspects of Thin Films Poster Session
Presenter: Y.S. Park, Sungkyunkwan University, Korea
Authors: Y.S. Park, Sungkyunkwan University, Korea
B. Hong, Sungkyunkwan University, Korea
Correspondent: Click to Email
With extreme hardness of diamond and synthetic diamond-like carbon (DLC), carbon based materials were used mainly as a cutting tool coating and as an abrasive material. Since then, carbon based materials have been expanded into the market of electronics, optics and acoustics as well as coatings due to excellent electrical properties. Amorphous carbon (a-C) and hydrogenated amorphous carbon films were deposited on p-type silicon and glass substrates by a closed-field unbalanced magnetron (CFUBM) sputtering method. We have investigated the effect of various DC bias voltages on microstructure, electrical conductivity and optical properties. The samples were characterized with Raman spectroscopy, XPS, electrical resistivity, current-voltage (I-V) and capacitance-voltage (C-V) curves, UV-visible and FT-IR. The a-C and a-C:H films prepared by CFUBM sputter in this study show good conducting properties.