AVS 52nd International Symposium
    Thin Films Monday Sessions
       Session TF-MoP

Paper TF-MoP48
TiN and TiO@sub2@:Nb Thin Film Preparation using Hollow Cathode Sputtering with Application to Solar Cells

Monday, October 31, 2005, 5:00 pm, Room Exhibit Hall C&D

Session: Aspects of Thin Films Poster Session
Presenter: S.Y. Guo, Energy Photovoltaics, Inc.
Authors: S.Y. Guo, Energy Photovoltaics, Inc.
W.N. Shafarman, University of Delaware
A.E. Delahoy, Energy Photovoltaics, Inc.
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Hollow cathode sputtering has found many applications for deposition of functional thin films. In particular, excellent TCOs, including In@sub 2@O@sub 3@:Ti, have been produced by reactive-environment hollow cathode sputtering.@footnote 1@ Recently, we have investigated titanium-based thin films using similar methods. TiN is well known for its excellent conductivity, inertness, and good optical reflectivity at long wavelengths. These properties make it a potential IR-reflective back contact material suitable for ultra-thin CIGS solar cells. Using a pulsed power, linear hollow cathode source, TiN films on Mo-coated glass were achieved by adopting a combination of four critical parameters. Two of these were the passing of nitrogen through the cathode cavity and magnetic field assistance. Electrical and optical properties of the films were measured. The optical emission spectrum of the Ar/N@sub 2@/Ti plasma and film XRD measurements will be reported. The effect of deposition parameters such as nitrogen flow rate, pressure, substrate bias and substrate temperature have also been studied. CIGS solar cells have been successfully fabricated on TiN and a conversion efficiency of 11.7% has so far been achieved. Transparent and somewhat conductive TiO@sub 2@ films doped with Nb were also prepared. The electrical and optical properties of these films will be reported. @FootnoteText@ @footnote 1@ A.E. Delahoy and S.Y. Guo, J. Vac. Sci. Technol. A, Jul/Aug 2005.