AVS 45th International Symposium, Wednesday, 11/4/1998 Sessions

Wednesday November 4, 1998 Sessions

Click a title to see the papers

Room	WeM Wednesday, 11/4/98, 8:20am	WeA Wednesday, 11/4/98, 2:00pm
307	AS+BI+SS-WeM Organized Molecular Monolayers	AS-WeA Polymer Surfaces, Films and Interfaces
308	SS1-WeM Physics of Semiconductors	SS1-WeA Electromigration and Surface Transport
309	SS2-WeM Gas-Surface Dynamics	SS2-WeA Photochemistry and Deposition
310	TF-WeM ULSI Metalization and Interconnects	TF-WeA Advances in Sputtering
314/315	SS3-WeM Surface Dynamics and Roughening	EM1-WeA Si Surface Chemistry
316	EM-WeM Fundamentals of Si Cleaning and CMP	EM2-WeA Application of Scanning Probes to Electronic Materials
317	MS-WeM Advanced Process Equipment and ES&H	MS-WeA Process Control and Yield from Tool to Factory
318/319/320	PS-WeM Plasma Damage	PS-WeA Plasma-Surface Interactions I
321/322/323	NS+AS-WeM Innovative Force, Near-Field Optics, and Tunneling Measurements
324/325	MI+EM-WeM Spin-dependent Devices: Technology and Processing	MI+NS-WeA Nanoscale Magnetics: Imaging and Fabrication
326
327	SE-WeM Selected Energy Epitaxial Growth Processes	SE-WeA Novel Sources for Selected Energy Growth
328
329	VT-WeM Vacuum Microelectronics	VT-WeA Vacuum Systems and Components