| AVS 45th International Symposium | |
| Electronic Materials and Processing Division | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | EM1-WeA1 Invited Paper Understanding the Evolution of Surface Morphology during Chemical Etching M.A. Hines, J. Flidr, Y.-C. Huang, T.A. Newton, Cornell University |
| 2:40pm | EM1-WeA3 Structure of a Passivated Ge Surface Prepared from Aqueous Solution P.F. Lyman, Northwestern University, D.T. Keane, Northwestern University and DND CAT, D.L. Marasco, T.-L. Lee, Northwestern University, M.J. Bedzyk, Northwestern University and Argonne National Lab |
| 3:00pm | EM1-WeA4 Reflectance Difference Spectroscopy of Ge / Si(001) V. Zielasek, S.G. Jaloviar, M.G. Lagally, University of Wisconsin, Madison |
| 3:20pm | EM1-WeA5 Second Harmonic Study of Ge/Si(100) and Si@sub 1-x@Ge@sub x@(100) Films P.S. Parkinson, D.E. Brown, M.C. Downer, J.G. Ekerdt, University of Texas, Austin |
| 3:40pm | EM1-WeA6 Silicon Epoxide: Fundamental Intermediate in Si(100) Oxidation A.B. Gurevich, Columbia University, M.K. Weldon, Y.J. Chabal, B.B. Stefanov, K. Raghavachari, Bell Laboratories, Lucent Technologies |
| 4:00pm | EM1-WeA7 Structure of Ultrathin Silicon Oxide - Silicon Interfaces Studied by Ultraviolet Photoelectron Spectroscopy J.W. Keister, J.E. Rowe, North Carolina State University, J.J. Kolodziej, Rutgers University, H. Niimi, North Carolina State University, T.E. Madey, Rutgers University, G. Lucovsky, North Carolina State University |
| 4:20pm | EM1-WeA8 Influence of Rapid Thermal Annealing on Vicinal Si(111)/SiO@sub 2@ Interfaces Investigated by Optical Second Harmonic Generation. J.F.T. Wang, G.D. Powell, D.J. Stephens, R.S. Johnson, B.R. Solazzo, Y. Wu, D.E. Aspnes, G. Lucovsky, North Carolina State University |
| 4:40pm | EM1-WeA9 The Initial Stages of Si(100) Oxynitridation by NO: An Infrared Study J. Eng, Jr., K.T. Queeney, Y.J. Chabal, B.B. Stefanov, K. Raghavachari, Bell Laboratories, Lucent Technologies, X. Zhang, E. Garfunkel, Rutgers University |
| 5:00pm | EM1-WeA10 Growth and Analyses of Silicon Nitride Thin Films on Si(111) and Si(100) X.-S. Wang, N. Cue, Hong Kong University of Science & Technology, China |