| AVS 45th International Symposium | |
| Surface Science Division | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | SS1-WeA1 Invited Paper Quantifying Surface Electromigration: Si(111) as a Model System@footnote 1@ E.D. Williams, University of Maryland, College Park |
| 2:40pm | SS1-WeA3 Electromigration and Cluster Motion@footnote 1@ O. Pierre-Louis, T.L. Einstein, University of Maryland, College Park |
| 3:00pm | SS1-WeA4 Theory of Surface Electromigration on Metals P.J. Rous, D.N. Bly, University of Maryland, Baltimore County |
| 3:20pm | SS1-WeA5 Theory of Surface Electromigration on Stepped and Islanded Surfaces. J. Cheng, P.J. Rous, University of Maryland, Baltimore County |
| 3:40pm | SS1-WeA6 Surface Electromigration Processes on Gold and Copper Films N. Shimoni, O. Biham, O. Millo, The Hebrew University, Israel |
| 4:00pm | SS1-WeA7 Molecular Dynamics Studies of Interlayer Mass Transport and Dendritic-to-Compact Morphological Transitions during Submonolayer Growth on Pt(111) Surfaces V. Chirita, E.P. Münger, J.-E. Sundgren, Linköping University, Sweden, J.E. Greene, University of Illinois, Urbana |
| 4:20pm | SS1-WeA8 Edge Barriers and Mass Transport on Metal (100) Surfaces@footnote 1@ W.W. Pai, The University of Tennessee, J.F. Wendelken, Oak Ridge National Laboratory |
| 4:40pm | SS1-WeA9 Metal Row Growth on a High-Index Silicon Surface H.H. Song, K.M. Jones, S.R. Blankenship, J.A. Carlisle, A.A. Baski, Virginia Commonwealth University |
| 5:00pm | SS1-WeA10 One Dimensional Growth Behavior of Xe Atoms on Step Edges of Cu(111) J.-Y. Park, Y. Kuk, Seoul National University, Korea, K. Miyake, H. Shigekawa, University of Tsukuba, Japan |