| AVS 45th International Symposium | |
| Thin Films Division | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | TF-WeA1 Invited Paper Preferential Sputtering Effects in Thin Film Processing S. Berg, I.V. Katardjiev, Uppsala University, Sweden |
| 2:40pm | TF-WeA3 Measurements and Modeling of Ti and Ta Sputtering as a Function of Target Microstructure and Temperature J.P. Allain, D.A. Alman, D.N. Ruzic, University of Illinois, Urbana-Champaign |
| 3:00pm | TF-WeA4 Reactor-Scale Models for Rf-Diode Sputtering for GMR Thin-Film Growth S. Desa, S. Ghosal, R.L. Kosut, J.L. Ebert, A. Kozak, T.E. Abrahamson, SC Solutions, J.F. Groves, H.N.G. Wadley, D.W. Zou, University of Virginia |
| 3:20pm | TF-WeA5 Using Pulsed DC Power for Reactive Sputtering of Al@sub 2@O@sub 3@ A. Belkind, A. Freilich, Stevens Institute of Technology, R. Scholl, Advanced Energy Industries |
| 3:40pm | TF-WeA6 Suppression of Hillocks and Whiskers on Al Films Deposited onto a Glass H. Saka, Y. Suzuki, Nagoya University, Japan, H. Takatsuji, K Tsujimoto, IBM, Japan, K. Kuroda, Nagoya University, Japan, S. Tsuji, IBM, Japan |
| 4:00pm | TF-WeA7 Substrate Bombardment and Heating in Dual Magnetron Sputtering Using Mid-Frequency AC J. Plaisted, Kinneo, G.W. McDonough, G.A. Roche, Advanced Energy |
| 4:20pm | TF-WeA8 A Novel Approach to Collimated Physical Vapor Deposition A.P. Paranjpe, D. Heimanson, J.C.S. Kools, P.V. Schwartz, K. Song, B. Bergner, S. McAllister, CVC |
| 4:40pm | TF-WeA9 Microcrystalline Silicon Thin Films Deposited By Low Temperature Reactive Magnetron Sputtering: The Effect Of Using Deuterium vs. Hydrogen J.E. Gerbi, University of Illinois, Urbana-Champaign, D.S. Kim, SAIT, Korea, G. Ben Amor, Ecole Polytechnique, France, J.R. Abelson, University of Illinois, Urbana-Champaign |
| 5:00pm | TF-WeA10 Atomistic Simulations of the Sputter Deposition of Copper W. Zou, J.F. Groves, X.W. Zhou, H.N.G. Wadley, University of Virginia |