AVS 45th International Symposium | |
Magnetic Interfaces and Nanostructures Technical Group | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | MI+EM-WeM1 Invited Paper Limiting Factors in Dense Pseudo Spin Valve and Spin Dependent Tunneling Memory Arrays A.V. Pohm, M.C. Tondra, C.A. Nordman, J.M. Anderson, Nonvolatile Electronics |
9:00am | MI+EM-WeM3 New Aspects of GMR Spin Valves: Enhancing Specular Electron Scattering and Using Surfactants for Improved Growth W.F. Egelhoff, Jr., National Institute of Standards and Technology |
9:20am | MI+EM-WeM4 High Temperature Pinning Properties of IrMn vs. FeMn in Spin Valves M.C. Tondra, D. Wang, Nonvolatile Electronics |
9:40am | MI+EM-WeM5 Invited Paper Magnetisation Reversal Studies by TEM of Continuous and Patterned GMR Films J.N. Chapman, University of Glasgow, United Kingdom |
10:20am | MI+EM-WeM7 Invited Paper Deposition and Processing of Novel GMR Structures @footnote 1@ J.R. Childress, University of Florida, Gainesville |
11:00am | MI+EM-WeM9 Direct-Measurement of Spin-Dependent Transport Across Ferromagnetic and Non-Magnetic Thin Films S.K. Upadhyay, R.N. Louie, R.A. Buhrman, Cornell University |
11:20am | MI+EM-WeM10 Effect of Noble Gas Addition (He,Ar,Xe) on Cl@sub 2@-Based Etching of NiFe and NiFeCo K.B. Jung, H. Cho, Y-.B. Hahn, E.S. Lambers, Y.D. Park, S.J. Pearton, University of Florida, Gainesville, J.R. Childress, IBM Almaden Research Center, M. Jenson, A.T. Hurst, Jr., Honeywell, Inc. |
11:40am | MI+EM-WeM11 Magnetoresistance Properties in Granular Silicide Thin Films Formed by High Dose Iron Implantation M.F. Chiah, W.Y. Cheung, S.P. Wong, I.H. Wilson, The Chinese University of Hong Kong |