| AVS 45th International Symposium | |
| Manufacturing Science and Technology Group | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | MS-WeA1 Invited Paper Factory Implementation of Process Control: Technical or Cultural Challenge? K.G. Vickers, Texas Instruments |
| 2:40pm | MS-WeA3 Invited Paper Advanced Process Control and Sensor Requirements for Reducing Non-Product Wafer Usage and to Increase Tool OEE in 300mm Manufacturing M.L. Passow, J. Pace, IBM Corporation |
| 3:20pm | MS-WeA5 Invited Paper Process Module Control Technology for 300mm Plasma Processing F. Kaveh, B. McMillin, W. Collison, Lam Research Corporation |
| 4:00pm | MS-WeA7 Invited Paper Using Wafermap Data for Automated Yield Analysis@footnote 1@ K.W. Tobin, T.P. Karnowski, S.S. Gleason, Oak Ridge National Laboratory, D. Jensen, F. Lakhani, C. Long, SEMATECH |
| 4:40pm | MS-WeA9 Invited Paper Visual Data Mining of Defectivity Data using Parallel Coordinates A. Chatterjee, IBM Research |