AVS 45th International Symposium | |
Electronic Materials and Processing Division | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
2:00pm | EM2-WeA1 Oscillating Contrasts Surrounding Charged Defects and Dopant Atoms in (110) Surfaces of III-V Semiconductor at Room-Temperature Ph. Ebert, C. Domke, M. Heinrich, K. Urban, Forschungszentrum Jülich, Germany |
2:20pm | EM2-WeA2 Two-Dimensional Carrier Profiling of III-V Structures using Scanning Spreading Resistance Microscopy P. De Wolf, T. Hantschel, IMEC, Belgium, M. Geva, C.L. Reynolds, Bell Laboratories, Lucent Technologies, W. Vandervorst, IMEC, Belgium, F. Bylsma, Bell Laboratories, Lucent Technologies |
2:40pm | EM2-WeA3 The Structure of InAs/AlSb/InAs Surfaces and Interfaces Grown by MBE B.Z. Nosho, W.H. Weinberg, University of California, Santa Barbara, B.V. Shanabrook, B.R. Bennett, W. Barvosa-Carter, L.J. Whitman, Naval Research Laboratory |
3:00pm | EM2-WeA4 In-Situ STM of MBE Growth Quality for GaAs(001) and InP(001)* G. Lengel, F.G. Johnson, W.T. Beard, R.J. Phaneuf, Laboratory for Physical Sciences, E.D. Williams, University of Maryland |
3:20pm | EM2-WeA5 Structural and Morphological Studies of GaN Heteroepitaxy on SiC(0001) V. Ramachandran, A.R. Smith, R.M. Feenstra, D.W. Greve, Carnegie Mellon University |
3:40pm | EM2-WeA6 Impact of Deposition Method on the Microstructural and Electrical Properties of Thin Film Silica Aerogels C. Caragianis-Broadbridge, L. Carmona, M. Farag, M. Guillorn, F. Stellabotte, Trinity College |
4:00pm | EM2-WeA7 Invited Paper UHV STM Nanofabrication and the Giant Deuterium Isotope Effect: Applications to CMOS Technology J.W. Lyding, M.C. Hersam, G.C. Abeln, E.T. Foley, J. Lee, Z. Chen, D.S. Thompson, J.S. Moore, S.-T. Hwang, H. Choi, K. Hess, University of Illinois, Urbana-Champaign |
4:40pm | EM2-WeA9 Scanning Probe Microscopy Imaging of IC Cross Sections K.-J. Chao, R.J. Plano, J.R. Kingsley, X. Lu, I. Ward, Charles Evans & Associates |
5:00pm | EM2-WeA10 Silicon Nitride Islands as Oxidation Masks for the Formation of Silicon Nano-Pillars J.S. Ha, K.-H. Park, W.S. Yun, E.-H. Lee, ETRI, Republic of Korea |