| AVS 47th International Symposium | |
| Thin Films | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| TF-TuP1 Influence of Annealing Temperature on Simultaneous Vapor Deposited Calcium Phosphate Thin Films M. Hamdi, A.M. Ektessabi, Kyoto University, Japan |
| TF-TuP3 Formation and Evolution of Photoluminescence Si-based Nanostructured Thin Films Prepared by Laser Ablation A. Kabashin, M. Meunier, Ecole Polytechnique de Montreal, Canada, R. Leonelli, University of Montreal, Canada |
| TF-TuP4 Deposition of Device Quality Amorphous Silicon, a-Si:H, Thin Films by the Hollow Cathode Plasma-Jet Reactive Sputtering System Z. Hubicka, R.J. Soukup, G.K. Pribil, N.J. Ianno, University of Nebraska, Lincoln |
| TF-TuP5 Influence of Bias Voltages on the Oxygen Diffusion Behaviour in dc Magnetron Sputtered In/Sn Films M. Quaas, H. Wulff, H. Steffen, R. Hippler, University of Greifswald, Germany |
| TF-TuP6 Study on Indium Nitride Films Deposited by DC Magnetron Sputtering P.K. Song, D. Sato, N. Ito, Y. Shigesato, Aoyama Gakuin University, Japan |
| TF-TuP7 The Effect of Heat-treatment on the Structural and Mechanical Properties of MoS@sub 2@/Ti Composite Coatings B.J. Kim, J.H. Dautzenberg, Eindhoven University of Technology, The Netherlands |
| TF-TuP8 Supermagnetron Plasma CVD and Qualitative Analysis of Electrical Conductive Hard Carbon (DLC) Films H. Kinoshita, M. Yoshida, Shizuoka University, Japan |
| TF-TuP9 Deposition of W Films using Different Underlayers L.V. Kozlovsky, A. Antinsh, V. Pashkevich, University of Daugavpils, Latvia |
| TF-TuP10 Energetic Oxygen Ions in the Reactive Sputtering of Zr Target in Ar+O@sub 2@ Atmosphere K. Tominaga, T. Kikuma, University of Tokushima, Japan |
| TF-TuP11 Low Temperature Crystallization of TiO@sub 2@ Thin Films Sputter-deposited in Ar-H@sub 2@O Plasma T. Ohwaki, Y. Taga, TOYOTA Central R&D Labs., Inc., Japan |
| TF-TuP12 Selective Growth of TiO@sub 2@ Thin Films on Si(100) Surfaces by Combination of MOCVD and Microcontact Printing Method B.-C. Kang, J.-H. Lee, H.-Y. Chae, D.-Y. Jung, S.-B. Lee, J.-H. Boo, Sungkyunkwan University, Korea |
| TF-TuP13 Oxidation Kinetics of the Growth of Thin Alumina formed by Plasma Oxidation A. Quade, H. Wulff, University of Greifswald, Germany |
| TF-TuP14 Epitaxial Growth of CeO@sub 2@ Film on YSZ Buffered Si (111) Substrates J.H. Yang, K.W. Lee, J.W. Seo, C.Y. Park, Sungkyunkwan University, Korea |
| TF-TuP15 The Effect of Annealing on the Electroless Plated Cu Metallization for Sub-micron Interconnection J.H. Lin, National Tsing Hua University, Taiwan, T.L. Lee, National Chiao Tung University, Taiwan, Y.Y. Tsai, X.W. Liu, National Tsing Hua University, Taiwan, C.C. Lin, National Chiao Tung University, Taiwan, H.C. Shih, National Tsing Hua University, Taiwan |
| TF-TuP16 SrBi@sub 2@Ta@sub 2@O@sub 9@ Ferroelectric Films Deposited by PLD Under Different Annealing Conditions M.P. Cruz, Centro de Investigacion y de Estudios Superiores de Ensenada, México, J.J. Portelles, Universidad de La Habana, Cuba, J.M. Siqueiros, UNAM, México |
| TF-TuP17 Effect of Pulsing in Dual-mode Microwave/Radio Frequency Plasma on the Growth of SiN@sub 1.3@ Optical and Protective Coatings R. Vernhes, O. Zabeida, J.E. Klemberg-Sapieha, L. Martinu, Ecole Polytechnique of Montreal, Canada |
| TF-TuP18 Synthesis of Cubic Boron Nitride Films on Ion Implanted Silicon Substrates Q. Li, Z.F. Zhou, I. Bello, C.S. Lee, S.T. Lee, City University of Hong Kong, China |
| TF-TuP19 Preparation and Characterization of Amorphous CN@sub x@ Thin Films by Pulsed Laser Deposition Y. Aoi, K. Ono, K. Sakurada, E. Kamijo, Ryukoku University, Japan, M. Sasaki, K. Sakayama, Industrial Research Center of Shiga Prefecture, Japan |
| TF-TuP20 Sputtered Aluminum Nitride Thin Films for Bulk Acoustic Wave Resonators R.N. Tait, Carleton University, Canada |
| TF-TuP21 Monochromatized Light Emitter using Si Doped Glass with Dielectric Multilayer Resonator T. Ichinohe, Tokyo National College of Technology, Japan, S. Nozaki, H. Morisaki, The University of Electro-Communications, Japan, S. Masaki, Tokyo National College of Technology, Japan, K. Kawasaki, TDY Co. Ltd., Japan |
| TF-TuP22 Measurement of Boron and Phosphorus Concentration in BPSG Thin Films Using FTIR and Artificial Neural Networks M.F. Tabet, W.A. McGahan, Nanometrics Inc. |
| TF-TuP23 Investigation of the W-TiN Metal Gate for Metal-Oxide-Semiconductor Devices S. Youn, K. Roh, S. Yang, Y. Roh, Y.C. Jang, K.S. Kim, N.-E. Lee, Sungkyunkwan University, Korea |
| TF-TuP24 Effect of Interlayer on Thermal Stability of Nickel Silicide J.S. Maa, Y. Ono, F. Zhang, S.T. Hsu, Sharp Laboratories of America, Inc. |
| TF-TuP25 Optical and Structural Properties of Sol-gel SiO@sub 2@ Layers Containing Cobalt A. Ramos-Mendoza, H. Tototzintle-Huitle, A. Mendoza-Galván, J. González-Hernández, CINVESTAV-IPN, México, B.S. Chao, Energy Conversion Devices, Inc. |
| TF-TuP26 Perpendicular Magnetic Anisotropy in Ultrathin YIG Films Prepared by Pulsed Laser Deposition Technique E. Popova, N. Keller, Versailles University, France, F. Gendron, Pierre and Marie Curie University, France, M. Guyot, M.-C. Brianso, M. Tessier, Versailles University, France |
| TF-TuP27 Mechanical and Structural Characteristics of Nanocrystalline Diamond (NCD) and Diamond-like Carbon (DLC) Coatings P. Jedrzejowski, Ecole Polytechnique de Montreal, Canada, J. Grabarczyk, P. Niedzielski, S. Mitura, Technical University of Lodz, Poland, J.E. Klemberg-Sapieha, L. Martinu, Ecole Polytechnique de Montreal, Canada |
| TF-TuP28 Microstructure and Optoelectronic Properties of a-SiGe:H Thin Films Fabricated by the Low Frequency (55 kHz) Glow Discharge B.G. Budaguan, A.A. Sherchenkov, G.L. Gorbulin, Moscow Institute of Electronic Technology, Russia, A.A. Berdnikov, Moscow Institute of Microelectronics of Russian Academy of Science, Russia, V.D. Chernomordic, Institute of Microelectronics of Russian Academy of Science, A.A. Aivazov, UniSil Corp. |
| TF-TuP29 Deposition and Properties of Tetrahedral Carbon Films Prepared on Magnetic Hard Disks C.Y. Chan, K.H. Lai, M.K. Fung, I. Bello, R.F. Huang, C.S. Lee, S.T. Lee, City University of Hong Kong, China, S.P. Wong, Chinese University of Hong Kong, China |
| TF-TuP30 Properties of Multicomponent Transition Metal Carbide Coatings Prepared by Magnetron Sputtering S.H. Koutzaki, J.E. Krzanowski, University of New Hampshire |
| TF-TuP31 Ferromagnetic Resonance and Magnetic Anisotropy in Epitaxial Fe/Ag Thin Films on GaAs (100) W. Wu, University of California, Irvine, C.S. Tsai, University of California, Irvine and Academia Sinica, Taiwan, C.C. Lee, H.J. Yoo, R. Chuang, H. Hopster, University of California, Irvine |
| TF-TuP32 Importance of Thermal Stress in a Thin Film Lipon Solid Electrolyte F. Vereda, R.B. Goldner, T. Haas, Tufts University |
| TF-TuP33 Structural, Morphological, and Mechanical Properties of Plasma Deposited Hydrogenated Amorphous Carbon Thin Films: Noble Gas Dilution Effects L. Valentini, J.M. Kenny, G. Carlotti, G. Socino, Universita di Perugia, Italy, G. Mariotto, P. Tosi, Universita di Trento, Italy, L. Lozzi, S. Santucci, Universita dell'Aquila, Italy |
| TF-TuP34 Structural Characterization of Tungsten Trioxide Thin Films L.J. LeGore, R.J. Lad, J.F. Vetelino, B.G. Frederick, University of Maine, E.A. Kenik, Oak Ridge National Laboratory |
| TF-TuP35 Study on the Oxidation Behavior of Poly Si @sub 1-x@Ge @sub x@ Films S.-K. Kang, D.-H. Ko, Yonsei University, Korea, S.-H. Oh, C.-G. Park, Pohang University of Science and Technology, Korea, T.-H. Ahn, M.-S. Joo, Hyundai Electronics Industries Co. Ltd, Korea, K.-C. Lee, D.-Y. Yang, Ju-Sung Engineering Co. Ltd, Korea |
| TF-TuP36 Mechanism of the Isothermic Amorphous-to-Crystalline Phase Transition in Ge:Sb:Te Ternary Alloys J. González-Hernández, E.F. Prokhorov, Yu.V. Vorobiev, E. Morales-Sánchez, A. Mendoza-Galván, Centro de Investigacion y de Estudios Avanzados del IPN, Mexico, S.A. Kostylev, Energy Conversion Devices, Inc., Y.I. Gorobets, V.N. Zakharchenko, R.V. Zakharchenko, Kiev Politechnic Institute, Ukraine |
| TF-TuP37 Dry Cleaning of Oxide and Contaminaions on Cu Surface in Water Ambient H. Ogawa, K. Taniguchi, Y. Horiike, The University of Tokyo, Japan |
| TF-TuP38 Characterization of the Reactive Species in an Atmospheric-Pressure Nitrogen Plasma G. Ding, S.E. Babayan, G. Nowling, R.F. Hicks, University of California, Los Angeles |