AVS 47th International Symposium
    Thin Films Tuesday Sessions
       Session TF-TuP

Paper TF-TuP19
Preparation and Characterization of Amorphous CN@sub x@ Thin Films by Pulsed Laser Deposition

Tuesday, October 3, 2000, 5:30 pm, Room Exhibit Hall C & D

Session: Poster Session
Presenter: Y. Aoi, Ryukoku University, Japan
Authors: Y. Aoi, Ryukoku University, Japan
K. Ono, Ryukoku University, Japan
K. Sakurada, Ryukoku University, Japan
E. Kamijo, Ryukoku University, Japan
M. Sasaki, Industrial Research Center of Shiga Prefecture, Japan
K. Sakayama, Industrial Research Center of Shiga Prefecture, Japan
Correspondent: Click to Email
Compounds in carbon-nitrogen system are interesting because they exhibit unique properties such as high value of hardness, low friction coefficient, chemical inertness, and variable elctronic and optical properties. In this paper, amorphous carbon nitride (a-CN@sub x@) thin films were deposited on a Si substrate by pulsed laser deposition (PLD) by use of graphite target under various deposition conditions. We have investigated the bonding structure of deposited films. Structural changes by heat treatment were also investigated. The PLD system used in this study consists of a KrF excimer laser, nitrogen radical beam source, and vacum chamber. The laser beam was focused onto a rotating graphite target surface to give various energy density. Deposition was carried out in N@sub 2@ atmosphere, in Nitrogen plasma, and under irradiation of nitrogen radical beam. Heat treatment of films were carried out following to the deposition in the vacuum chamber. The films were charactereized by XPS, FT-IR, Raman spectroscopy, and TEM observation. The maximum N/C ratio of the deposited film was 0.24 in the present experimental conditions. N 1s electron spectra of deposited films indicated the nitrogen atoms in the film were mainly bonded to sp@super 2@ and sp@super 3@ hybridized carbon atoms. FT-IR and Raman spectra indicated that N-spC are small as compared with N-sp@super 2@C and N-sp@super 3@C. The fraction of N-sp@super 3@C increased with increasing N/C ratio in the deposited film. The heat treatment induced a nitrogen loss and graphitization of the film. It was found that nitrogen atoms bonded to sp@super 3@C are preferentially eliminated by heat treatment.