AVS 47th International Symposium
    Thin Films Tuesday Sessions
       Session TF-TuP

Paper TF-TuP10
Energetic Oxygen Ions in the Reactive Sputtering of Zr Target in Ar+O@sub 2@ Atmosphere

Tuesday, October 3, 2000, 5:30 pm, Room Exhibit Hall C & D

Session: Poster Session
Presenter: T. Kikuma, University of Tokushima, Japan
Authors: K. Tominaga, University of Tokushima, Japan
T. Kikuma, University of Tokushima, Japan
Correspondent: Click to Email
In the sputtering of Zr target in Ar+O@sub 2@ atmosphere, ZrO@sub 2@ films are deposited. However, sometimes anomalous phenomena that the films are easily peeled from the substrate or degraded. These seems to be due to the presence of the energetic oxygen ions which are generated in the sputtering. Therefore it becomes important to know the extent of the flux of energetic oxygen ions. We constructed a probe to estimate the flux of energetic oxygen ions and applied it to the observation of the energetic oxygen ions in the reactive sputtering of Zr. At the same time, we observed the photoemission intensity from the sputtered Zr atoms, monitoring the target surface oxidization. The results show that the Zr target is very active in oxygen atmosphere and oxydized fully with a small oxygen partial pressure. The flux of energetic oxygen ions increases with increasing the oxidized area of the target. The flux of energetic oxygen ions for Zr target is 2 or 3 times stronger than that for Zn target. This is thought to be due to the thick oxygen layers on the Zr target.