Start Time |
Session Code |
Session Title |
Monday 8:20am |
TF+EM-MoM |
ALD for Energy Conversion, Storage, and Electrochemical Processes |
Monday 8:20am |
EL+AS+EM+TF-MoM |
Application of SE for the Characterization of Thin Films and Nanostructures |
Monday 8:20am |
EM+MI+TF-MoM |
Growth, Electronic, and Magnetic Properties of Heusler Compounds |
Monday 1:40pm |
TF-MoA |
Emerging Applications for ALD |
Tuesday 8:00am |
TF-TuM |
Advanced CVD and ALD Processing, ALD Manufacturing and Spatial-ALD |
Tuesday 2:20pm |
TF-TuA |
ALD Precursors and Surface Reactions |
Tuesday 2:20pm |
AS+TF-TuA |
Problem Solving Using Surface Analysis in the Industrial Laboratory |
Wednesday 8:00am |
TF+EM+MI-WeM |
Thin Films for Microelectronics |
Wednesday 8:00am |
TF-WeM |
Thin Film for Photovoltaics |
Wednesday 8:00am |
2D+EM+SS+TF-WeM |
2D Materials Growth and Fabrication |
Wednesday 8:00am |
SP+SS+TF-WeM |
Probing and Manipulating Nanoscale Structure |
Wednesday 2:20pm |
PS+SS+TF-WeA |
Plasma Deposition |
Wednesday 2:20pm |
SE+2D+NS+SS+TF-WeA |
Nanostructured Thin Films and Coatings |
Thursday 8:00am |
TF+SE-ThM |
Control, Characterization, and Modeling of Thin Films I |
Thursday 8:00am |
TF-ThM |
Area-selective Deposition and Infiltration Growth Methods |
Thursday 8:00am |
PS+NS+SS+TF-ThM |
Atomic Layer Etching I |
Thursday 8:00am |
TR+AC+TF+VT-ThM |
Lubricant, Coatings, and Biotribology |
Thursday 2:20pm |
TF+MI+NS-ThA |
ALD and Nanostructures |
Thursday 2:20pm |
TF+MI-ThA |
Control, Characterization, and Modeling of Thin Films II |
Thursday 2:20pm |
PS+TF-ThA |
Plasma Enhanced ALD |
Thursday 6:30pm |
TF-ThP |
Thin Films Poster Session |
Friday 8:20am |
TF-FrM |
Self-assembled Monolayers and Organic/Inorganic Interface Engineering |
Friday 8:20am |
2D+MI+NS+SS+TF-FrM |
Nanostructures including Heterostructures and Patterning of 2D Materials |
Friday 8:20am |
PS+NS+SS+TF-FrM |
Atomic Layer Etching II |