| AVS 64th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS+NS+SS+TF-ThM1 Strategies to Control the Etch per Cycle During Atomic Layer Etching of SiO2 and SiNx Ryan Gasvoda, Colorado School of Mines, S. Wang, E.A. Hudson, Lam Research Corporation, S. Agarwal, Colorado School of Mines |
| 8:20am | PS+NS+SS+TF-ThM2 Enabling Atomic Layer Etching of Magnetic and Noble Metal Alloys Nicholas Altieri, E. Chen, University of California, Los Angeles, J.K. Chen, Lam Research Corporation, J.P. Chang, University of California, Los Angeles |
| 8:40am | PS+NS+SS+TF-ThM3 Invited Paper Directional Atomic Layer Etching: First Principles, Modelling and Applications Thorsten Lill, K. Kanarik, I.L. Berry, S. Tan, Y. Pan, V. Vahedi, R.A. Gottscho, Lam Research Corporation |
| 9:20am | PS+NS+SS+TF-ThM5 Thermal Atomic Layer Etching of VO2 Using Sequential Exposures of SF4 and Either Sn(acac)2 or BCl3 Jonas Gertsch, V.M. Bright, S.M. George, University of Colorado Boulder |
| 9:40am | PS+NS+SS+TF-ThM6 Atomic Layer Etching of MoS2 for Nanodevices KiSeok Kim, K.H. Kim, Y.J. Ji, G.Y. Yeom, Sungkyunkwan University, Republic of Korea |
| 11:00am | PS+NS+SS+TF-ThM10 Invited Paper Ge Atomic Layer Etching for High Performance FinFET W. Mizubayashi, AIST, Japan, S. Noda, Tohoku University, Japan, Y. Ishikawa, T. Nishi, AIST, Japan, A. Kikuchi, Tohoku University, Japan, H. Ota, AIST, Japan, P.-H. Su, Y. Li, National Chiao Tung University, Taiwan, S. Samukawa, Tohoku University, AIST, Japan, Kazuhiko Endo, AIST, Japan |
| 11:40am | PS+NS+SS+TF-ThM12 Numerical Simulations of Atomic-Layer Etching (ALE) for SiO2 and SiN Yuki Okada, Osaka University, Japan, R. Sugano, Hitachi, Ltd., Japan, M. Isobe, T. Ito, H. Li, K. Karahashi, S. Hamaguchi, Osaka University, Japan |
| 12:00pm | PS+NS+SS+TF-ThM13 Organometallic Etching Chemistry for Thermal Atomic Level Etching of Lanthanum Oxide Yoshihide Yamaguchi, K. Shinoda, Hitachi, Japan, Y. Kouzuma, S. Sakai, M. Izawa, Hitachi High-Technologies Corp., Japan |