| AVS 64th International Symposium & Exhibition | |
| Thin Films Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | TF+MI+NS-ThA1 Invited Paper Coating and Infilling 3D Geometries by Low-T CVD : HfB2 throughout 0.5 mm Thick CNT Forests John Abelson, University of Illinois at Urbana-Champaign |
| 3:00pm | TF+MI+NS-ThA3 Varying Penetration Depths in ALD on High Aspect Ratio Carbon Nanotube Forests David Kane, RC. Kane, R.R. Vanfleet, Brigham Young University |
| 3:20pm | TF+MI+NS-ThA4 NiOx Decorated Platinum Nanoparticles Via Atomic Layer Deposition for Enhanced Sintering Resistance Jiaming Cai, K. Cao, M. Gong, B. Shan, R. Chen, Huazhong University of Science and Technology, PR China |
| 4:00pm | TF+MI+NS-ThA6 Atomic Layer Deposition of HfO2/Al2O3 Nanolaminates on Single-crystal GaN and Ga2O3: Investigation of Device Degradation in Power Semiconductor Devices David Mandia, A. Yanguas-Gil, J.A. Libera, J.W. Elam, Argonne National Laboratory |
| 4:20pm | TF+MI+NS-ThA7 Atomic Layer Deposition Enabled Synthesis of Multiferroic Composite Nanostructures Jeffrey Chang, University of California at Los Angeles, A. Rosenberg, Stanford University, A. Buditama, University of California at Los Angeles, E. Jin, L. Kornblum, C. Ahn, Yale University, S.H. Tolbert, University of California at Los Angeles, K.A. Moler, Stanford University, J.P. Chang, University of California at Los Angeles |
| 4:40pm | TF+MI+NS-ThA8 Invited Paper Recent Developments in the Analysis of ALD/CVD Thin Film Conformality Riikka Puurunen, Aalto University, School of Chemical Engineering, Finland |
| 5:20pm | TF+MI+NS-ThA10 Spatial Atomic Layer Deposition Reactor Design for Nano-laminates X.L. Wang, Yun Li, J.L. Lin, J.M. Cai, R. Chen, Huazhong University of Science and Technology, PR China |