| AVS 64th International Symposium & Exhibition | |
| Thin Films Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF+SE-ThM1 In Situ Synchrotron Characterization Techniques Enabled Nanostructured Materials using ALD Yu Lei, University of Alabama in Huntsville |
| 8:20am | TF+SE-ThM2 Probing the Atomic Scale Structure of Polar Oxide Interfaces Sanaaz Koohfar, D.P. Kumah, North Carolina State University |
| 8:40am | TF+SE-ThM3 CVD Chemistry of Trimethylboron - Gas Phase Reactions and Surface Poisoning Effects Henrik Pedersen, L. Souqui, M. Imam, Linköping University, Sweden, R. Tonner, Philipps Universität Marburg, H. Högberg, Linköping University, Sweden |
| 9:20am | TF+SE-ThM5 Invited Paper In Situ Synchrotron-based Characterization of Noble Metal ALD Processes J. Dendooven, Eduardo Solano, R.K. Ramachandran, M.M. Minjauw, Ghent University, Belgium, A. Coati, Synchrotron SOLEIL, France, D. Hermida-Merino, ESRF, France, C. Detavernier, Ghent University, Belgium |
| 11:00am | TF+SE-ThM10 In-situ FTIR Study of the Atomic Layer Deposition of Scandium Oxide Films using Bis(methylcyclopentadienyl)3,5-dimethylpyrazolatoscandium with Ozone and with Water Rezwanur Rahman, J.P. Klesko, A. Dangerfield, University of Texas at Dallas, J.-S. Lehn, C.L. Dezelah, R. Kanjolia, EMD Performance Materials, Y.J. Chabal, University of Texas at Dallas |
| 11:20am | TF+SE-ThM11 Ultra Fast Compositional Depth Profile Analysis for Microelectronics Applications Agnès Tempez, Horiba France S.a.s., France, Y. Mazel, J.-P. Barnes, E. Nolot, CEA/LETI-University Grenoble Alpes, France, S. Legendre, Horiba France S.a.s., France, M. Chausseau, HORIBA Instruments Incorporated |
| 11:40am | TF+SE-ThM12 Surface Termination of Fe3O4(111) Films Studied by CO Adsorption Francesca Mirabella, E. Zaki, F. Ivars, S. Shaikhutdinov, H.-J. Freund, Fritz-Haber-Institut der Max-Planck-Gesellschaft, Germany, X. Li, J. Paier, J. Sauer, Humboldt Universität zu Berlin, Germany |