| AVS 64th International Symposium & Exhibition | |
| Thin Films Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF-ThM1 Invited Paper Thin-Film Encapsulation Based on ALD Technology for Organic Light-Emitting Diodes Tony Maindron, CEA-Leti, France |
| 8:40am | TF-ThM3 Vapor Phase Infiltration: Unifying the Research Community Around Processing Science Fundamentals Mark Losego, Georgia Institute of Technology |
| 9:00am | TF-ThM4 Vapor Phase Infiltration (VPI) of Polymers with Intrinsic Microporosity Emily McGuinness, F. Zhang, R.P. Lively, M.D. Losego, Georgia Institute of Technology |
| 9:20am | TF-ThM5 Organic Solvent Resistance of Hybrid Organic-Inorganic Films Synthesized via Vapor Phase Infiltration Collen Leng, M.D. Losego, Georgia Institute of Technology |
| 9:40am | TF-ThM6 Surface Selective CVD of Metallic Thin Films Using Inhibitor Molecules Elham Mohimi, Z. Zhang, S. Liu, B.B. Trinh, University of Illinois at Urbana-Champaign, J.L. Mallek, MIT Lincoln Laboratory, G.S. Girolami, J.R. Abelson, University of Illinois at Urbana-Champaign |
| 11:00am | TF-ThM10 Toward Area Selective Atomic Layer Deposition on Co, W and Ru Metal/Silicon Patterns Dara Bobb-Semple, S.F. Bent, Stanford University |
| 11:20am | TF-ThM11 Area-selective ALD of Ru by Combining an ABC-type ALD Process and O2 Plasma Etching S.N. Chopra, M.F.J. Vos, Eindhoven University of Technology, The Netherlands, J.G. Ekerdt, The University of Texas at Austin, W.M.M. Kessels, Adrie Mackus, Eindhoven University of Technology, The Netherlands |
| 11:40am | TF-ThM12 Enhancing the Inherent Area-selective ALD of TiO2 using BCl3 Seung Keun Song, P.C. Lemarie, G.N. Parsons, North Carolina State University |
| 12:00pm | TF-ThM13 Selective ALD by Intercalation of Etching Cycles in PEALD Process Rémi Vallat, R. Gassilloud, CEA/LETI-University Grenoble Alpes, France, C. Vallée, Université Grenoble Alpes & CEA, LETI, Minatec Campus, Grenoble, France |