AVS 64th International Symposium & Exhibition
    Plasma Science and Technology Division Wednesday Sessions

Session PS+SS+TF-WeA
Plasma Deposition

Wednesday, November 1, 2017, 2:20 pm, Room 22
Moderators: Jeffrey Shearer, IBM Research Division, Albany, NY, Thorsten Lill, Lam Research Corporation


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

2:20pm PS+SS+TF-WeA1
Correlation Between Ion Energies in CCRF Discharges and Film Characteristics of Titanium Oxides Fabricated via Plasma Enhanced Atomic Layer Deposition
Shinya Iwashita, T. Moriya, T. Kikuchi, N. Noro, T. Hasegawa, Tokyo Electron Limited, Japan, A. Uedono, University of Tsukuba, Japan
2:40pm PS+SS+TF-WeA2
Functionalized Titanium-Nitride Surfaces Formed by Femtosecond-Laser Processing
David Ruzic, S. Hammouti, B.J. Holybee, University of Illinois at Urbana-Champaign, B.E. Jurczyk, Starfire Industries
3:00pm PS+SS+TF-WeA3
Controlling the Thin Film Properties of Silica Synthesised by Atmospheric Pressure-Plasma Enhanced CVD
Fiona Elam, A.S. Meshkova, FOM institute DIFFER, Netherlands, B.C.A.M. van der Velden-Schuermans, S.A. Starostin, FUJIFILM Manufacturing Europe B.V., M.C.M. van de Sanden, H.W. de Vries, FOM Institute DIFFER, Netherlands
3:20pm PS+SS+TF-WeA4
Plasma Information Based Virtual Metrology for Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition
Hyun-Joon Roh, S. Ryu, Y. Jang, N.-K. Kim, Y. Jin, G.-H. Kim, Seoul National University, Republic of Korea
4:20pm PS+SS+TF-WeA7 Invited Paper
Sidewall Effects in the Modulation of Deposition Rate Profiles of a Capacitively Coupled Plasma Reactor
Hojun Kim, Samsung Electronics Co. Ltd., Republic of Korea
5:20pm PS+SS+TF-WeA10
Linear Magnetron Magnetic Field Optimization for HiPIMS Industrialization
Ian Haehnlein, J. McLain, B. Wu, I. Schelkanov, University of Illinois at Urbana-Champaign, B.E. Jurczyk, Starfire Industries, D.N. Ruzic, University of Illinois at Urbana-Champaign
5:40pm PS+SS+TF-WeA11
Investigating the Effect of the Substrate at Short Deposition Times for Plasma Polymerised Films
Karyn Jarvis, N.P. Reynolds, Swinburne University of Technology, Australia, L.D. Hyde, Melbourne Centre for Nanofabrication, Australia, S.L. McArthur, Swinburne University of Technology and CSIRO, Australia