| AVS 64th International Symposium & Exhibition | |
| Thin Films Division | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF-TuM1 Aluminum-Doped Zinc Oxide via Spatial ALD: Process Impact on Film Morphology, Electrical Conductivity and Stability S.F. Nelson, Lee Tutt, C.R. Ellinger, Eastman Kodak Company |
| 8:20am | TF-TuM2 Fast Pulsing of Precursor and Reactant to Merge ALD and CVD Processes: Example of Thick Al2O3 Deposition Fabien Piallat, L. Bonnet, J. Vitiello, KOBUS, France |
| 8:40am | TF-TuM3 Employing Atmospheric Pressure Micro-Plasma Printer for ALD of TiO2 Thin Films Morteza Aghaee, J. Verheijen, Eindhoven University of Technology, The Netherlands, A. Stevens, InnoPhysics B.V., The Netherlands, W.M.M. Kessels, M. Creatore, Eindhoven University of Technology, The Netherlands |
| 9:00am | TF-TuM4 Large-Area Atmospheric Pressure Spatial ALD C. Frijters, F. van den Bruele, F. Grob, Paul Poodt, Holst Centre / TNO, Netherlands |
| 9:20am | TF-TuM5 Invited Paper High Speed ALD of Multifunctional ALD Ultrabarriers for Flexible OLED Encapsulation Jacques Kools, Encapsulix, France |
| 11:00am | TF-TuM10 Simulation of Atomic Layer Deposition Paul Moroz, TEL Technology Center, America, LLC, D. Moroz, Harvard University |
| 11:20am | TF-TuM11 Boron Nitride Film Growth at Room Temperature Using Electron Enhanced Atomic Layer Deposition (EE-ALD) Jaclyn Sprenger, H. Sun, A.S. Cavanagh, S.M. George, University of Colorado Boulder |
| 11:40am | TF-TuM12 CVD of sp2-BN on Si(111) Substrates Laurent Souqui, H. Pedersen, H. Högberg, Linköping University, Sweden |
| 12:00pm | TF-TuM13 Microcontroller-based Sequential Deposition Control Systems using Behavior Tree Algorithms: ALD for the "App Generation" Brandon Piercy, J. Crane, M.D. Losego, Georgia Institute of Technology |