| 2:20pm |
TF-TuA1
Accelerated Searching of Potential Precursors for Silicon Carbide-atomic Layer Deposition from Ab-initio Machine Learning Methods
Zhigang Mei, S. Bhattacharya, A. Yacout, Argonne National Laboratory |
| 2:40pm |
TF-TuA2
Surface Chemistry of Ru Atomic Layer Deposition Precursors
X. Qin, Francisco Zaera, University of California |
| 3:00pm |
TF-TuA3
Mechanistic Aspects of ALD Ru Thin Film Growth based on Ru(DMBD)(CO)3 and H2O using Downstream Quadrupole Mass Spectrometry
Zhengning Gao, Washington University in St. Louis, R. Kanjolia, EMD Performance Materials, P. Banerjee, Washington University in St. Louis |
| 3:20pm |
TF-TuA4
Nucleation of Al2O3 Atomic Layer Deposition with Water or H2O2
Adam Hinckley, A.J. Muscat, University of Arizona |
| 4:20pm |
TF-TuA7
Direct Measurements of Half-Cycle Reaction Heats during Atomic Layer Deposition Provide Mechanistic Insights
Charles T. Campbell, J. Lownsbury, University of Washington, K.S. Kim, A.B.F. Martinson, Argonne National Laboratory |
| 4:40pm |
TF-TuA8
Cyclic Silane Precursors in Atomic and Molecular Layer Deposition
Nicholas Strandwitz, L. Ju, Lehigh University |
| 5:00pm |
TF-TuA9 Invited Paper
Area Selective Atomic Layer Deposition Via Precursor Selective Adsorption: Theory, Strategy, and Applications in Catalysis
Rong Chen, Huazhong University of Science and Technology, PR China |
| 5:40pm |
TF-TuA11 Invited Paper
AVS 2017 John A Thornton Memorial Award and Lecture: Atomic Layer Deposition: Highlights from the Last 25 Years
Steven George, University of Colorado at Boulder |