AVS 64th International Symposium & Exhibition | |
Thin Films Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
1:40pm | TF-MoA1 Probe the Reaction Chemistry during Atomic Layer Deposition onto CH3NH3PbI3 Qing Peng, X.Z. Yu, University of Alabama |
2:00pm | TF-MoA2 Digital Doping of ALD Nb:VO2 Thin Films for Thermochromic Applications Alexander Kozen, M. Currie, B.P. Downey, C.R. Eddy, Jr., V.D. Wheeler, U.S. Naval Research Laboratory |
2:20pm | TF-MoA3 Mechanisms in Organic and Hybrid Organic-Inorganic Molecular Layer Deposition David Bergsman, S.F. Bent, Stanford University |
2:40pm | TF-MoA4 Inorganic Modification of Cellulosic Fibers for Enhanced Oil Sorption Capacity Andrew Short, S. Pamidi, Z. Bloomberg, M.D. Losego, Georgia Institute of Technology |
3:20pm | TF-MoA6 Atomic Layer Deposition of Nano-Coatings on Fabrics for Antibacterial Applications Renee Puvvada, M. Bellavia, T.A. Sulchek, M.D. Losego, Georgia Institute of Technology |
4:00pm | TF-MoA8 Invited Paper ALD-based Functionalization of Biomaterials: Recent Developments and Future Challenges Christos Takoudis, University of Illinois at Chicago |
4:40pm | TF-MoA10 Titanium Nitride ALD using Ultra-high Purity Hydrazine at Low Temperature Dan Alvarez, J. Spiegelman, R. Holmes, S. Allanson, RASIRC, A.C. Kummel, S. Wolf, M. Kavrik, University of California, San Diego, K. Andachi, RASIRC |
5:00pm | TF-MoA11 ALD Barriers for Protection of Electronic Devices in Biological Environment Ankit Singh, K. Adstedt, S. Graham, Georgia Institute of Technology |