| AVS 55th International Symposium & Exhibition | |
| Thin Film | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| TF-ThP1 Surface Roughness of Amorphous Carbon Nitride Films Prepared by rf-Reactive Sputtering S. Kikuchi, M. Aono, N. Kitazawa, Y. Watanabe, National Defense Academy, Japan |
| TF-ThP2 Nanotribological Properties and Degradation of Ionic Liquid Films on Magnetic Tapes M. Palacio, B. Bhushan, The Ohio State University |
| TF-ThP3 Influence of Re-Deposition on Particle Generation C.F. Lo, Praxair Electronics |
| TF-ThP5 Synthesis of SiGeC Alloy by the Modified Ablation Laser Technique J.G. Quiñones Galván, F. de Moure Flores, E. Mota Pineda, S. Cerón Gutiérrez, CINVESTAV-IPN, Mexico, A. Hernández Hernández, Escuela Superior de Física Matemáticas-IPN, Mexico, M. González Alcudia, CICATA-IPN Unidad Altamira, Mexico, J.J. Araiza Ibarra, Universidad Autónoma de Zacatecas, Mexico, M. Meléndez Lira, CINVESTAV-IPN, Mexico |
| TF-ThP6 Surface, Interface, and Bulk Characterization of ALD Cu Films and PVD Dielectric Films L. Zhang, K. Lloyd, G. Blackman, L. Bao, J. Thompson, M. Plummer, D. Brill, J. Ryley, D. Reardon, DuPont |
| TF-ThP7 Characteristics of the Top-Emitting Organic Light-Emitting Diodes Based-on the Electronic Structure of the BaO-on-Alq3 Interface J.T. Lim, G.Y. Yeom, Sungkyunkwan University, Korea |
| TF-ThP8 Influences of Ceria-Mixed Abrasive Slurry on the Oxide-Chemical Mechanical Polishing S.J. Han, Y.K. Lee, S.W. Park, Chosun University, Republic of Korea, Y.J. Seo, Daebul University, Republic of Korea, W.S. Lee, Chosun University, Republic of Korea |
| TF-ThP9 Improvement of Tetra-Ethyl Ortho-Silicate Oxide - Chemical Mechanical Polishing Characteristics According to the Cerium Oxide Dispersion Time Y.K. Lee, S.J. Han, S.W. Park, Chosun University, Republic of Korea, Y.J. Seo, Daebul University, Republic of Korea, W.S. Lee, Chosun University, Republic of Korea |
| TF-ThP10 Influence of Ar/O2 Gas Ratio on the Performance of Sputtered-Deposited TiO2 Electrodes for the Application of Dye-Sensitized Solar Cells M.F. Hossain, S. Biswas, M. Shahjahan, T. Takahashi, University of Toyama, Japan |
| TF-ThP11 Electronic Structure of Self-Assembled Sm Nanostructure on HOPG Studied by Photoemission Spectroscopy G. Kutluk, M. Nakatake, H. Namatame, M. Taniguchi, Hiroshima University, Japan |
| TF-ThP12 The Influence of N-dopping for Titanium Dioxide Thin Films on Photo-functional Properties K. Tanaka, I. Takano, Kogakuin University, Japan |
| TF-ThP13 The Structural, Electrical and Optical Properties of ATO Films Prepared at Room Temperature by Radio Frequency Magnetron Sputtering for Transparent Electrodes S.U. Lee, Sungkyunkwan University, Korea, W.S. Choi, Hanbat National University, Korea, H.J. Kim, B. Hong, Sungkyunkwan University, Korea |
| TF-ThP14 Interface Control Effect of Nitrogen-doped Diamond-like Carbon by Ion Beam Assisted Deposition Method K. Harada, I. Takano, Kogakuin University, Japan |
| TF-ThP15 In Situ Spectroscopic Ellipsometry Studies of the Oxidation of Nickel Thin Films J. Rhim, S. Lee, H. Jeong, Hanyang University, South Korea, D. Kim, Ewha Womans University, South Korea, I. An, Hanyang University, South Korea |
| TF-ThP16 Study of Vanadium Oxide Thin Films Deposited by Pulsed DC Sputtering using a V2O3 Target K.E. Wells, S.S.N. Bharadwaja, M.W. Horn, The Pennsylvania State University |
| TF-ThP17 Atomic Layer Deposition of Lanthanum Based Oxides for High-K Gate Dielectrics A. Hande, B. Lee, H.C. Kim, R.M. Wallace, J. Kim, The University of Texas at Dallas, X. Liu, M. Rousseau, J. Yi, D.V. Shenai, J. Suydam, Rohm and Haas Electronic Materials, LLC. |
| TF-ThP18 Integrated UHV/ALD Reactor for Growth of Oxide Materials K. Pradhan, A.E. Wierzbinski, P.F. Lyman, University of Wisconsin-Milwaukee |
| TF-ThP19 Annealed Multilayer Thin Films of Al2O3-Y2O3 Using Atomic Layer Deposition J.C. Rowland, M. Davidson, P.H. Holloway, J. Jones, University of Florida |
| TF-ThP20 Deposition and Etching of Hexagonal and Cubic Boron Nitride M. Darnon, D.A. Neumayer, G. Gibson, Y. Zhang, IBM Research |
| TF-ThP21 Enhancement of Crystal Growth in μc-Si:H Thin Film Deposition by H Radical-Assisted Magnetron Sputtering and the Plasma Diagnostics K. Fukaya, K. Sasaki, A. Tabata, Nagoya University, Japan, N. Knake, Ruhr-Universität Bochum, Germany |
| TF-ThP22 Fabrication and Characterization of ZnO:(Ag-nano-particles) Thin Films Deposited by Spray Pyrolysis G. Alarcon, J. Guzman-Mendoza, M. Aguilar-Frutis, E. San Martín-Martínez, L. Ortega, CICATA, IPN, Mexico, C. Falcony, CINVESTAV-IPN, Mexico |
| TF-ThP23 Growth Rate Induced Epitaxial Orientation of Cerium Oxide Thin Films on Sapphire (0001) P. Nachimuthu, S.V.N.T. Kuchibhatla, F. Gao, V. Shutthanandan, M.H. Engelhard, Pacific Northwest National Laboratory, Z.Q. Yu, Nanjing Normal University, China, C.M. Wang, Pacific Northwest National Laboratory, S. Seal, University of Central Florida, S. Thevuthasan, W. Jiang, Pacific Northwest National Laboratory |
| TF-ThP24 Preparation of Very Thin GZO Transparent Electrodes with a Low Resistivity by a VAPE Method T. Minami, T. Miyata, T. Ito, Y. Honma, Kanazawa Institute of Technology, Japan |
| TF-ThP25 Relationship Between Oxide Targets and Properties of Impurity-doped ZnO Thin Films Deposited by DC Magnetron Sputtering J. Oda, T. Miyata, T. Minami, Kanazawa Institute of Technology, Japan |
| TF-ThP26 Transparent Conducting Si-co-doped AZO Thin Films Prepared by Magnetron Sputtering Using AZO Powder Targets Containing SiC J. Nomoto, T. Miyata, T. Minami, Kanazawa Institute of Technology, Japan |
| TF-ThP27 Transparent Conducting AZO Thin Films Prepared Using Oxide Targets Sintered by Millimeter-wave Heating T. Miyata, Y. Hara, K. Okada, Kanazawa Institute of Technology, Japan, H. Abe, Fuji Dempa Kogyo Co. Ltd., Japan, T. Minami, Kanazawa Institute of Technology, Japan |
| TF-ThP28 Study of Semiconductors III-V, IV-VI and II-VI Films Growth by PLD-M System M. González-Alcudia, CICATA-IPN, México, M. Meléndez-Lira, CINVESTAV-IPN, México, O. Calzadilla-Amaya, Universidad Habana, Cuba, M. Zapata-Torres, CICATA-IPN, México |
| TF-ThP29 Mutual Inductance Characteristics of a Thin Film Planar Loop G.A. Topasna, D.M. Topasna, F.R. Powell, Virginia Military Institute |
| TF-ThP30 Room Temperature Photoluminescence from CdTe Nanocrystals Embedded within a SiO2 Matrix Deposited on Silicon Employing Reactive RF Sputtering E. Mota-Pineda, M.A. Melendez-Lira, CINVESTAV IPN Mexico |
| TF-ThP31 The Influence of Pt Layers on the Corrosion Resistance of TiAl/TiAlN Multilayers M. Flores, Universidad de Guadalajara, Mexico, J. Avalos, UAM-I, Mexico, L. Huerta, R. Escamilla, UNAM, Mexico |
| TF-ThP32 Characterization of Metal Oxide Electrical Properties for Band Engineered Catalysis M.C. Kratzer, E.G. Seebauer, University of Illinois at Urbana-Champaign |
| TF-ThP33 Deposition and Characterization of Bi doped Ge2Sb2Te5 Thin Films for Phase Change Random Access Memory Application J.H. Lee, S.W. Ryu, Y.B. Ahn, C.S. Hwang, H.J. Kim, Seoul National University, South Korea |
| TF-ThP34 Dynamic Scaling and Optical Study for Optimization of Thermally Evaporated Ag Thin Films on Glass J.R. Skuza, C. Clavero, R.A. Lukaszew, College of William & Mary |
| TF-ThP35 Study of Slope Distribution with Mathematical Molding on Au(111) Thin Film Growth A. Gonzalez-Gonzalez, J.L. Sacedon, E. Rodriguez-Cañas, Instituto de Ciencia de Materiales de Madrid (CSIC), Spain, J.A. Aznarez, Instituto de Fisica Aplicada (CSIC), Spain, E. Vasco, Instituto de Ciencia de Materiales de Madrid (CSIC), Spain |