| AVS 55th International Symposium & Exhibition | |
| Thin Film | Thursday Sessions |
| Session TF-ThP |
| Session: | Aspects of Thin Films |
| Presenter: | J. Rhim, Hanyang University, South Korea |
| Authors: | J. Rhim, Hanyang University, South Korea S. Lee, Hanyang University, South Korea H. Jeong, Hanyang University, South Korea D. Kim, Ewha Womans University, South Korea I. An, Hanyang University, South Korea |
| Correspondent: | Click to Email |
Nickel oxide film is an attractive material for electrochromic devices as well as resistance random access memory devices. In this work, e-beam evaporated nickel films are thermally oxidized in oxygen ambient at various temperatures. In situ spectroscopic ellipsometry is employed to study the oxidation process of nickel films. The optical and microstructural properties of nickel oxide films are deduced and these are compared with the electrical properties. When the nickel film is not fully oxidized, the optical properties of nickel oxide show the inclusion of nickel element. This film shows low resistivity and poor switching characteristics.