| AVS 66th International Symposium & Exhibition | |
| Thin Films Division | Thursday Sessions |
| Session TF-ThP |
| Session: | Thin Films Poster Session |
| Presenter: | Bohuei Liao, Taiwan Instrument Research Institute |
| Authors: | B.H. Liao, Taiwan Instrument Research Institute C.-N. Hsiao, Taiwan Instrument Research Institute, Taiwan, Republic of China |
| Correspondent: | Click to Email |
Fluorine-doped SiO2 films were deposited by magnetron sputtering with a Si metal target at room temperature. In order to obtain better optical and mechanical properties, films were investigated under different ratios of O2 to CF4 gas. The optical properties, microstructure, surface roughness, and crystalline structure, of fluorine-doped SiO2 films have been studied. The transmittance increased as increasing the CF4 gas in the ultraviolet range. The refractive index decreased as increasing the CF4 gas.