| AVS 66th International Symposium & Exhibition | |
| Thin Films Division | Thursday Sessions |
| Session TF-ThP |
| Session: | Thin Films Poster Session |
| Presenter: | Lukasz Walczak, PREVAC sp. z o.o., Poland |
| Correspondent: | Click to Email |
Magnetics, optoelectronics, energy storage and renewables, catalysis and nanoelectronics, semiconductors, new graphene-type materials and their surface are under intensive investigation of many research groups [1-3]. The wide variety of novel technologies and materials available, precise, well defined scientific problems or proprietary production recipes demand customized analysis and deposition systems.
Innovative and compact PREVAC surface analysis platform as part of multi-technique surface analysis system will be presented, in order to permit complete characterization of nanomaterials in the UHV and ambient pressure conditions. We will report some results from these systems.
Also we introduced PREVAC deposition platforms, based on well tested MBE system technology, offering a high quality and stable UHV performance. Compact construction allows the connection of different deposition sources at versatile configurations as well as the incorporation of RHEED, inventive alternative GIFAD [4] and other analysis techniques.
As the next deposition platform the sputtering systems for depositing metal and dielectric thin films on substrates at the different temperature will be shown. A range of magnetron sputtering sources, using RF, DC, or pulsed DC power, can be operated in the multimode by SYNTHESIUM software for producing thin films.
Finally we describe PREVAC’s PLD systems. Typically it is used with a focused pulsed excimer laser to vaporize a small section of a solid target material in a vacuum chamber in order to produce thin-films. Standalone configuration or as part of a larger integrated research system, system is fully automated. The transfer system features a six position target manipulator which allows transfer of both target and substrate holders for simple and efficient operation.
References:
1. L. K. Preethi, et al., Sci. Rep. , 14314 (2017)
2. M. Weis, et al., Sci. Rep. 7, 13782 (2017)
3. N. M. Freitag et al., Nature Nanotechn. 13, 392-397 (2018)
4. A. Momeni et al. J. Phys. Chem. Lett., 9, 908–913 (2018)